Dr. Amir-Hossein Tamaddon Profile

Dr. Amir-Hossein Tamaddon

at imec

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Publications (7)

Proceedings Article | 10 April 2024 Presentation + Paper

Feature grouping to enable edge placement error-aware process control in multi-feature logic use case

Guillaume Schelcher, Marsil Athayde, Stijn Schoofs, Jeff Hsia, Zuan Khalik, Fahong Li, Konstantin Nechaev, Reza Sahraeian, Amir-Hossein Tamaddon, Victor Blanco, Stefan van der Sanden, Yichen Zhang, Roy Anunciado, Harm Dillen, Philippe Leray

Proceedings Volume 12955, 129550O (2024) https://doi.org/10.1117/12.3010421

KEYWORDS: Semiconducting wafers, Overlay metrology, Cross validation, Process control, Logic, Metrology, Simulations, Scanning electron microscopy, Lithography

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Proceedings Article | 1 May 2023 Presentation + Paper

EUV lithography line-space pattern rectification using block copolymer directed self-assembly: a roughness and defectivity study

Julie Van Bel, Lander Verstraete, Hyo Seon Suh, Stefan De Gendt, Philippe Bezard, Jelle Vandereyken, Waikin Li, Matteo Beggiato, Amir-Hossein Tamaddon, Christophe Beral, Andreia Santos, Boaz Alperson, YoungJun Her

Proceedings Volume 12497, 124970K (2023) https://doi.org/10.1117/12.2657990

KEYWORDS: Directed self assembly, Block copolymers, Extreme ultraviolet, Annealing, Film thickness, Extreme ultraviolet lithography, Line edge roughness, Critical dimension metrology, Semiconducting wafers, Line width roughness

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Proceedings Article | 1 May 2023 Presentation + Paper

Mitigating stochastics in EUV lithography by directed self-assembly

L. Verstraete, Hyo Seon Suh, Julie Van Bel, Purnota Hannan Timi, Remi Vallat, Philippe Bezard, Jelle Vandereyken, Matteo Beggiato, Amir-Hossein Tamaddon, Christophe Beral, Waikin Li, Mihir Gupta, Roberto Fallica

Proceedings Volume 12497, 124970I (2023) https://doi.org/10.1117/12.2657939

KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Extreme ultraviolet lithography, Bridges, Etching

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Proceedings Article | 27 April 2023 Presentation + Paper

Alignment and overlay through opaque metal layers

V. Blanco Carballo, E. Canga, C. Jehoul, A. Moussa, A. Tamaddon, C. Tabery, G. Gunjala, B. Menchtchikov, V. Zacca, S. Lalbahadoersing, A. den Boef, R. Synowicki

Proceedings Volume 12496, 124960I (2023) https://doi.org/10.1117/12.2658084

KEYWORDS: Ruthenium, Optical alignment, Semiconducting wafers, Overlay metrology, Oxides, Silicon, Metals, Etching, Scanners, Copper

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Proceedings Article | 20 September 2020 Presentation

Influence and control of CD on defectivity for EUV Pitch 32 Line-Space

Christophe Béral, Anne-Laure Charley, Philippe Leray, Frederic Lazzarino, Romuald Blanc, Poulomi Das, Ataklti Weldeslassie, Amir-Hossein Tamaddon, Werner Gillijns

Proceedings Volume 11517, 115170N (2020) https://doi.org/10.1117/12.2572865

KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Reticles, Extreme ultraviolet lithography, Scanners, Etching

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Proceedings Article | 26 March 2019 Presentation + Paper

Staggered pillar patterning using 0.33NA EUV lithography

Danilo De Simone, Romuald Blanc, Jeroen Van de Kerkhove, Amir-Hossein Tamaddon, Roberto Fallica, Lieve Van Look, Nouredine Rassoul, Frederic Lazzarino, Nadia Vandenbroeck, Pieter Vanelderen, Gian Lorusso, Frieda Van Roey, Anne-Laure Charley, Geert Vandenberghe, Kurt Ronse, Kilyoung Lee, Junghyung Lee, Sarohan Park, Chang-Moon Lim, Chan-Ha Park

Proceedings Volume 10957, 109570T (2019) https://doi.org/10.1117/12.2515170

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Semiconducting wafers, Etching, Extreme ultraviolet, Critical dimension metrology, Image processing, Failure analysis, Scanning electron microscopy, Image analysis

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Proceedings Article | 25 March 2019 Presentation + Paper

Exploration of EUV-based self-aligned multipatterning options targeting pitches below 20nm

S. Decoster, F. Lazzarino, D. Vangoidsenhoven, V. B. Carballo, A.-H. Tamaddon, E. Kesters, C. Lorant

Proceedings Volume 10960, 109600L (2019) https://doi.org/10.1117/12.2515173

KEYWORDS: Optical lithography, Amorphous silicon, Photomasks, Oxides, Scanning electron microscopy, Etching, Extreme ultraviolet, Extreme ultraviolet lithography, Atomic layer deposition

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Showing 5 of 7 publications

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