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Dr. Andrew P. Szaberszky
Director/R&D
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 1 June 1990 Paper
Enhanced structures for through-the-lens alignment with DUV lithography
Andrew Sabersky, Robert Naber, Kevin Riddell
Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20194
KEYWORDS: Optical alignment, Semiconducting wafers, Reticles, Interference (communication), Metals, Signal detection, Optical lithography, Deep ultraviolet, Target detection, Mirrors
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