Dr. Angelika Müllender
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (3)

SPIE Journal Paper | 10 December 2022
JM3, Vol. 22, Issue 02, 021002, (December 2022) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.021002
KEYWORDS: Signal to noise ratio, Metrology, Scanning electron microscopy, Shrinkage, Line scan image sensors, Semiconducting wafers, Photoresist materials, Critical dimension metrology, Extreme ultraviolet lithography, Line width roughness

Proceedings Article | 26 May 2022 Presentation + Paper
Gian Francesco Lorusso, Christophe Beral, Janusz Bogdanowicz, Danilo De Simone, Mahmudul Hasan, Christiane Jehoul, Alain Moussa, Mohamed Saib, Mohamed Zidan, Joren Severi, Vincent Truffert, Dieter Van den Heuvel, Alex Goldenshtein, Kevin Houchens, Gaetano Santoro, Daniel Fischer, Angelika Muellender, Joey Hung, Roy Koret, Igor Turovets, Kit Ausschnitt, Chris Mack, Tsuyoshi Kondo, Tomoyasu Shohjoh, Masami Ikota, Anne-Laure Charley, Philippe Leray
Proceedings Volume 12053, 120530O (2022) https://doi.org/10.1117/12.2614046
KEYWORDS: Fourier transforms, Signal to noise ratio, Metrology, Line width roughness, Scanning electron microscopy, Semiconducting wafers, Atomic force microscopy, Scatterometry, Extreme ultraviolet lithography, Image quality

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 120530P (2022) https://doi.org/10.1117/12.2613990
KEYWORDS: Scanning electron microscopy, Metrology, Critical dimension metrology, Extreme ultraviolet lithography, Line width roughness

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