Dr. Anna Andrle Profile

Dr. Anna Andrle

at Lawrence Berkeley National Laboratory

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 27 April 2023 Presentation + Paper

Small target compatible dimensional and analytical metrology for semiconductor nanostructures using x-ray fluorescence techniques

Philipp Hönicke, Yves Kayser, Victor Soltwisch, Andre Wählisch, Nils Wauschkuhn, Jeroen Scheerder, Claudia Fleischmann, Janusz Bogdanowicz, Anne-Laure Charley, Anabela Veloso, Roger Loo, Hans Mertens, Andriy Hikavyy, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Richard Ciesielski, Burkhard Beckhoff

Proceedings Volume 12496, 124961J (2023) https://doi.org/10.1117/12.2657963

KEYWORDS: Nanostructures, X-ray fluorescence spectroscopy, Metrology, Semiconductors, Fluorescence intensity, Data modeling, Transmission electron microscopy, Small targets

Read Abstract +

Proceedings Article | 1 December 2022 Paper

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

Qais Saadeh, Hazem Mesilhy, Victor Soltwisch, Andreas Erdmann, Richard Ciesielski, Leonhard Lohr, Anna Andrle, Vicky Philipsen, Devesh Thakare, Christian Laubis, Frank Scholze, Michael Kolbe

Proceedings Volume 12293, 122930Y (2022) https://doi.org/10.1117/12.2643246

KEYWORDS: Extreme ultraviolet, Scatterometry, Photomasks, Refractive index, Scattering, Reflectivity, Metrology, Databases, Oxidation, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet coatings, Modeling and simulation, Optical constants, Optical metrology

Read Abstract +

Proceedings Article | 1 November 2022 Paper

High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments

V. Soltwisch, S. Glabisch, A. Andrle, V. Philipsen, Q. Saadeh, S. Schröder, L. Lohr, R. Ciesielski, S. Brose

Proceedings Volume 12472, 124720Q (2022) https://doi.org/10.1117/12.2640176

KEYWORDS: Extreme ultraviolet, Scatterometry, Diffraction, Reflectivity, X-rays, Photomasks, Reflectometry, Scattering, Ruthenium, Optical components

Read Abstract +

Proceedings Article | 21 June 2021 Presentation + Paper

Identifying the type of line edge roughness using grazing-incidence x-ray fluorescence

Zanyar Salami, Analía Fernández Herrero, Anna Andrle, Philipp Hönicke, Victor Soltwisch

Proceedings Volume 11783, 1178307 (2021) https://doi.org/10.1117/12.2592611

KEYWORDS: Line edge roughness, Line width roughness, Nanostructures, X-ray fluorescence spectroscopy, X-rays, Oxides, Scatterometry, Grazing incidence, Finite element methods

Read Abstract +

Proceedings Article | 22 February 2021 Presentation

GIXRF and machine learning as metrological tools for shape and element sensitive reconstructions of periodic nanostructures

Anna Andrle, Philipp Hönicke, Grzegorz Gwalt, Philipp-Immanuel Schneider, Yves Kayser, Frank Siewert, Victor Soltwisch

Proceedings Volume 11611, 116110R (2021) https://doi.org/10.1117/12.2586082

KEYWORDS: Nanostructures, Metrology, Machine learning, X-rays, X-ray optics, X-ray fluorescence spectroscopy, Statistical analysis, Semiconducting wafers, Reflectivity, Nondestructive evaluation

Read Abstract +

Proceedings Article | 21 June 2019 Presentation + Paper

Grazing incidence x-ray fluorescence based characterization of nanostructures for element sensitive profile reconstruction

Anna Andrle, Philipp Hönicke, Philipp Schneider, Yves Kayser, Martin Hammerschmidt, Sven Burger, Frank Scholze, Burkhard Beckhoff, Victor Soltwisch

Proceedings Volume 11057, 110570M (2019) https://doi.org/10.1117/12.2526082

KEYWORDS: Luminescence, Nanostructures, Particle swarm optimization, Silicon, Optimization (mathematics), X-rays, X-ray fluorescence spectroscopy, Finite element methods, Oxides, Sensors

Read Abstract +

Proceedings Article | 14 March 2018 Presentation

From heterostructure design to package: development of efficient and reliable UVB LEDs (Conference Presentation)

Neysha Lobo Ploch, Tim Kolbe, Arne Knauer, Jens Rass, Hyun Kyong Cho, Johannes Glaab, Jan Ruschel, Anna Andrle, Sylvia Hagedorn, Katrin Hilbrich, Christoph Stoelmacker, Steffen Knigge, Maria Reiner, Ina Ostermay, Andreas Thies, Deepak Prasai, Olaf Krueger, Sven Einfeldt, Markus Weyers, Michael Kneissl

Proceedings Volume 10532, 1053220 (2018) https://doi.org/10.1117/12.2287131

KEYWORDS: Light emitting diodes, Heterojunctions, Electron beam lithography, Ultraviolet radiation, Packaging, Ultraviolet light emitting diodes, Mercury, Lamps, Phototherapy, Vapor phase epitaxy

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years