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Atsutoshi Inokuchi
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Publications (1)
Proceedings Article | 22 February 2021 Poster + Presentation + Paper
EUV defect reduction activities using coater/developer and etching technique
Takahiro Shiozawa, Keisuke Yoshida, Noriaki Nagamine, Arnaud Dauendorffer, Satoru Shimura, Kathleen Nafus, Yannick Feurprier, Kenta Ono, Shota Yoshimura, Atsutoshi Inokuchi, Kiyoshi Maeda, Tetsuya Nishizuka, Shinya Morikita, Yoshihide Kihara, Ken Kobayashi
Proceedings Volume 11612, 116120T (2021) https://doi.org/10.1117/12.2583772
KEYWORDS: Extreme ultraviolet, Etching, Extreme ultraviolet lithography, Stochastic processes, Photoresist processing, Particles, Lithographic illumination, High volume manufacturing
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