Dr. David H. Ziger Profile

Dr. David H. Ziger

Corporate Applications Engineer

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 20 March 2018 Paper

Improving 130nm node patterning using inverse lithography techniques for an analog process

Can Duan, Scott Jessen, David Ziger, Mizuki Watanabe, Steve Prins, Chi-Chien Ho, Jing Shu

Proceedings Volume 10587, 1058718 (2018) https://doi.org/10.1117/12.2297219

KEYWORDS: Source mask optimization, Lithography, Photomasks, Scanners, Optical proximity correction, Semiconducting wafers, Silicon, Optical lithography

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Proceedings Article | 17 October 2008 Paper

Extracting mask error function from intensity slices

David Ziger

Proceedings Volume 7122, 71223W (2008) https://doi.org/10.1117/12.801821

KEYWORDS: Photomasks, Semiconducting wafers, Nanoimprint lithography, Metals, Visualization, Image enhancement, Manufacturing, Semiconductor manufacturing, Semiconductors, Mask making

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Proceedings Article | 21 March 2007 Paper

Intelligent visualization of lithography violations

David Ziger

Proceedings Volume 6521, 65211E (2007) https://doi.org/10.1117/12.714515

KEYWORDS: Lithography, Visualization, Error analysis, Photomasks, Critical dimension metrology, Cadmium sulfide, Metals, Tolerancing, Optical proximity correction, Inspection

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Proceedings Article | 9 November 2005 Paper

A new methodology for quantifying OPC recipe accuracy

David Ziger, Dave Gerold, Charles King, Frank Amoroso, Joshua Tuttle, Robert Lugg

Proceedings Volume 5992, 599258 (2005) https://doi.org/10.1117/12.633172

KEYWORDS: Optical proximity correction, Photomasks, Critical dimension metrology, Databases, Phase shifts, Lithography, Tolerancing, Inspection, Matrices, Image processing

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Proceedings Article | 28 June 2005 Paper

65nm mask CD qualification on critical features through simulation based lithography verification

Paul van Adrichem, John Valadez, David Ziger, Dave Gerold

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617519

KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Reticles, Computed tomography, Semiconducting wafers, Metrology, Lithography, Mask making, Silicon

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Proceedings Article | 28 May 2004 Paper

Swing curve prediction from reflectance spectra: a new method to predict optimal resist thicknesses and compare processes

David Ziger

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544237

KEYWORDS: Reflectivity, Semiconducting wafers, Silicon, Ultraviolet radiation, Photoresist processing, Solids, Silicon films, Coating, Refractive index, Thin film coatings

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Proceedings Article | 16 July 2002 Paper

Linear alignment correction algorithm for deep-submicron lithography

David Ziger, Pierre Leroux

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473434

KEYWORDS: Semiconducting wafers, Optical alignment, Calibration, Data modeling, Lithography, Diffractive optical elements, Reticles, Distortion, Silicon, Overlay metrology

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SPIE Journal Paper | 1 July 2000

Understanding optical end of line metrology

David Ziger, Pierre Leroux

OE, Vol. 39, Issue 07, (July 2000) https://doi.org/10.1117/12.10.1117/1.602580

KEYWORDS: Scanning electron microscopy, Optical testing, Metrology, Solids, Optical metrology, Diffraction, Diffraction gratings, Wafer-level optics, Optical alignment, Reflectivity

Proceedings Article | 14 June 1999 Paper

Understanding optical end of line metrology

David Ziger, Pierre Leroux

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350807

KEYWORDS: Error analysis, Image quality, Scanning electron microscopy, Optical testing, Metrology, Photomasks, Solids, Wafer-level optics, Optical alignment, Semiconducting wafers

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Proceedings Article | 7 July 1997 Paper

Complementary alignment metrology: a visual technique for alignment monitoring

David Ziger, Pierre Leroux

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275959

KEYWORDS: Semiconducting wafers, Optical alignment, Matrices, Visualization, Error analysis, Metrology, Photomasks, Eye, Standards development, Wafer-level optics

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SPIE Journal Paper | 1 January 1997

Line-size effects on ultraviolet reflectance spectra

David Ziger, Thomas Adams, Joseph Garofalo

OE, Vol. 36, Issue 01, (January 1997) https://doi.org/10.1117/12.10.1117/1.601167

KEYWORDS: Reflectivity, Deep ultraviolet, Silicon, Ultraviolet radiation, Interfaces, Scattering, Reflection, Atomic force microscopy, Scanning electron microscopy, Diffraction

Proceedings Article | 21 May 1996 Paper

Linesize effects on UV reflectance spectra

David Ziger, Thomas Adams, Joseph Garofalo

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240115

KEYWORDS: Reflectivity, Deep ultraviolet, Silicon, Scattering, Reflection, Ultraviolet radiation, Interfaces, Photoresist materials, Scanning electron microscopy, Diffraction

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SPIE Journal Paper | 1 January 1992

Generalized characteristic model for lithography: application to negative chemically amplified resists

David Ziger, Chris Mack, Romelia Distasio

OE, Vol. 31, Issue 01, (January 1992) https://doi.org/10.1117/12.10.1117/12.56038

KEYWORDS: Lithography, Chemically amplified resists, Systems modeling, Photoresist materials, Data modeling, Temperature metrology, Diffusion, Photoresist developing, Semiconducting wafers, Performance modeling

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Proceedings Article | 1 July 1991 Paper

Use of antireflective coatings in deep-UV lithography

Satyendra Sethi, Romelia Distasio, David Ziger, James Lamb, Tony Flaim

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44772

KEYWORDS: Antireflective coatings, Reflectivity, Semiconducting wafers, Lithography, Excimer lasers, Oxides, Deep ultraviolet, Etching, Aluminum, Tungsten

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Proceedings Article | 1 July 1991 Paper

Resist tracking: a lithographic diagnostic tool

Clifford Takemoto, David Ziger, William Connor, Romelia Distasio

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44435

KEYWORDS: Photoresist processing, Lithography, Deep ultraviolet, Inspection, Integrated circuits, Metrology, Process control, Humidity, Diagnostics, Photoresist materials

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Proceedings Article | 1 June 1991 Paper

Generalized characteristic model for lithography: application to negative chemically amplified resists

David Ziger, Chris Mack, Romelia Distasio

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46378

KEYWORDS: Lithography, Chemically amplified resists, Systems modeling, Data modeling, Semiconducting wafers, Catalysis, Photoresist materials, Performance modeling, Temperature metrology, Radon

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Showing 5 of 16 publications

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