CONFERENCE PROCEEDINGS
Advanced Search
Efrat Noifeld
at Applied Materials Israel, Ltd
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 8 April 2019 Paper
Macro CDSEM 2D metrology supporting advanced DRAM patterning
R. Kris, G. Klebanov, I. Schwarzband, E. Sommer, L. Gershtein, B. Mathew, E. Noifeld, S. Levy, R. Alkoken, O. Novak, H. Miroku, D. Rathore , S. Pastur, S. Duvdevani-Bar, T. Bar-On, I. Horikawa
Proceedings Volume 10959, 109592S (2019) https://doi.org/10.1117/12.2515233
KEYWORDS: Metrology, Critical dimension metrology, Process control, Scanning electron microscopy, Optical lithography, Algorithm development, Detection and tracking algorithms, Mathematical modeling, Image enhancement, Computer aided design
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top