Dr. Fedor Trintchouk Profile

Dr. Fedor Trintchouk

Director of System Integration at Dimension Genomics Inc

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Publications (7)

Proceedings Article | 16 March 2009 Paper

Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source

Rostislav Rokitski, Vladimir Fleurov, Robert Bergstedt, Hong Ye, Robert Rafac, Robert Jacques, Fedor Trintchouk, Toshihiko Ishihara, Rajasekhar Rao, Theodore Cacouris, Daniel Brown, William Partlo

Proceedings Volume 7274, 72743O (2009) https://doi.org/10.1117/12.816049

KEYWORDS: Double patterning technology, Polarization, Laser stabilization, Light sources, Scanners, High volume manufacturing, Immersion lithography, Lithography, Deep ultraviolet, Modulation

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Deep ultraviolet (DUV) lithography improvements have been focused on two paths: further increases in the effective numerical aperture (NA) beyond 1.3, and double patterning (DP). High-index solutions for increasing the effective NA have not gained significant momentum due to several technical factors, and have been eclipsed by an aggressive push to make DP a high-volume manufacturing solution. The challenge is to develop a cost-effective solution using a process that effectively doubles the lithography steps required for critical layers, while achieving a higher degree of overlay performance. As a result, the light source requirements for DP fall into 3 main categories: (a) higher power to enable higher throughput on the scanner, (b) lower operating costs to offset the increased number of process steps, and (c) high stability of optical parameters to support more stringent process requirements. The XLR 600i (6kHz, 90W @15mJ) was introduced last year to enable DP by leveraging the higher performance and lower operating costs of the ring architecture XLR 500i (6kHz, 60W @10mJ) platform currently used for 45nm immersion lithography in production around the world. In February 2009, the XLR 600ix was introduced as a 60/90W switchable product to provide flexibility in the transition to higher power requirements as scanner capabilities are enhanced. The XLR 600ix includes improved optics materials to meet reliability requirements while operating at higher internal fluences. In this paper we will illustrate the performance characteristics during extended testing. Examples of performance include polarization stability, divergence and pointing stability, which enable consistent pupil fill under extreme illumination conditions, as well as overall thermal stability which maintains constant beam performance under large changes in laser operating modes. Furthermore, the unique beam uniformity characteristics that the ring architecture generates result in lower peak energy densities that are comparable to those of a typical 60W excimer laser. In combination with the XLR's long pulse duration, this allows for long life scanner optics while operating at 15mJ.

SPIE Journal Paper | 1 July 2008

Impact of finite laser bandwidth on the critical dimension of L/S structures

Peter De Bisschop, Ivan Lalovic, Fedor Trintchouk

JM3, Vol. 7, Issue 03, 033001, (July 2008) https://doi.org/10.1117/12.10.1117/1.2964297

KEYWORDS: Critical dimension metrology, Optical simulations, Laser scanners, 3D scanning, Laser stabilization, Scanners, Convolution, Semiconducting wafers, Laser metrology, Laser damage threshold

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Proceedings Article | 17 March 2008 Paper

XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

Vladimir Fleurov, Slava Rokitski, Robert Bergstedt, Hong Ye, Kevin O’Brien, Robert Jacques, Fedor Trintchouk, Efrain Figueroa, Theodore Cacouris, Daniel Brown, William Partlo

Proceedings Volume 6924, 69241R (2008) https://doi.org/10.1117/12.776927

KEYWORDS: Double patterning technology, Light sources, Immersion lithography, Control systems, Scanners, Excimer lasers, Pulsed laser operation, Laser scanners, 3D scanning, Semiconducting wafers

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Proceedings Article | 15 March 2006 Paper

Active spectral control of DUV light sources for OPE minimization

Wayne Dunstan, Robert Jacques, Robert Rafac, Rajasekhar Rao, Fedor Trintchouk

Proceedings Volume 6154, 61542J (2006) https://doi.org/10.1117/12.659283

KEYWORDS: Actuators, Light sources, Fluorine, Deep ultraviolet, Molybdenum, Imaging systems, Optical proximity correction, Metrology, Control systems, Laser stabilization

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Proceedings Article | 15 March 2006 Paper

XLA-300: the fourth-generation ArF MOPA light source for immersion lithography

Fedor Trintchouk, Toshihiko Ishihara, Walter Gillespie, Richard Ness, Robert Bergstedt, Christian Wittak, Richard Perkins

Proceedings Volume 6154, 615423 (2006) https://doi.org/10.1117/12.658723

KEYWORDS: Light sources, Metrology, Spectroscopy, Scanners, Polarization, Immersion lithography, Acoustics, Manufacturing, Control systems, Pulsed laser operation

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Proceedings Article | 12 May 2005 Paper

XLA-200: the third-generation ArF MOPA light source for immersion lithography

Toshihiko Ishihara, Robert Rafac, Wayne Dunstan, Fedor Trintchouk, Christian Wittak, Richard Perkins, Robert Bergstedt, Walter Gillespie

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600075

KEYWORDS: Gas lasers, Pulsed laser operation, Polarization, Molybdenum, Light sources, Spectroscopy, Immersion lithography, Fluorine, Birefringence, Beam controllers

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Proceedings Article | 26 June 2003 Paper

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Vladimir Fleurov, Daniel Colon, Daniel Brown, Patrick O'Keeffe, Herve Besaucele, Alexander Ershov, Fedor Trintchouk, T. Ishihara, Paolo Zambon, R. Rafac, A. Lukashev

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485358

KEYWORDS: Molybdenum, Light sources, Excimers, Control systems, Lithography, Optical amplifiers, Acoustics, Optical lithography, Oscillators, Energy efficiency

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Showing 5 of 7 publications

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