Dr. Gong Chen Profile

Dr. Gong Chen

Senior Member Technical Staff at Headway Technology Inc

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Author

Publications (10)

Proceedings Article | 11 May 2009 Paper

Automated reticle inspection data analysis for wafer fabs

Derek Summers, Gong Chen, Bryan Reese, Trent Hutchinson, Marcus Liesching, Hai Ying, Russell Dover

Proceedings Volume 7379, 737935 (2009) https://doi.org/10.1117/12.824355

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Data analysis, Defect inspection, Photomasks, Air contamination, Databases, Manufacturing, Error analysis

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Proceedings Article | 24 March 2009 Paper

Automated reticle inspection data analysis for wafer fabs

Derek Summers, Gong Chen, Bryan Reese, Trent Hutchinson, Marcus Liesching, Hai Ying, Russell Dover

Proceedings Volume 7272, 72723P (2009) https://doi.org/10.1117/12.815545

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Data analysis, Defect inspection, Photomasks, Air contamination, Databases, Manufacturing, Error analysis

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Proceedings Article | 17 October 2008 Paper

Improving contact and via process latitude through selective upsizing

C. Yuan, G. Abeln, B. Anthony, G. Chen, S. Robertson, P. Walker

Proceedings Volume 7122, 712223 (2008) https://doi.org/10.1117/12.801187

KEYWORDS: Photomasks, Semiconducting wafers, Printing, Manufacturing, Optical proximity correction, Metals, Detection and tracking algorithms, Failure analysis, Semiconductors, Semiconductor manufacturing

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Proceedings Article | 17 October 2008 Paper

Evaluation of Double Process Lithography (DPL) with bi-layer photo-resist process for contact layer-patterning

Gong Chen, Kevin Wu

Proceedings Volume 7122, 71220O (2008) https://doi.org/10.1117/12.800988

KEYWORDS: Lithography, Silicon, Etching, Photomasks, Semiconducting wafers, Printing, Optical lithography, Image processing, Photoresist processing, 193nm lithography

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Proceedings Article | 17 October 2008 Paper

Automated reticle inspection data analysis for wafer fabs

Derek Summers, Gong Chen, Bryan Reese, Trent Hutchinson, Marcus Liesching, Hai Ying, Russell Dover

Proceedings Volume 7122, 71223F (2008) https://doi.org/10.1117/12.801524

KEYWORDS: Reticles, Inspection, Semiconducting wafers, Data analysis, Defect inspection, Photomasks, Air contamination, Databases, Manufacturing, Error analysis

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Proceedings Article | 16 November 2007 Paper

The study of phase-angle and transmission specifications of 6% att-EAPSM for 90nm, 65nm, and 45nm node wafer manufacturing patterning process

Gong Chen, Cesar Garza

Proceedings Volume 6730, 67302R (2007) https://doi.org/10.1117/12.740717

KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Manufacturing, Image transmission, Image processing, Optical lithography, Semiconductors, Quartz, Wafer manufacturing

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Proceedings Article | 20 October 2006 Paper

Phase-shift reticle design impact on patterned linewidth variation and LWR

Jim Vasek, Chong-Cheng Fu, Gong Chen

Proceedings Volume 6349, 63491S (2006) https://doi.org/10.1117/12.686594

KEYWORDS: Photomasks, Critical dimension metrology, Reticles, Manufacturing, Line width roughness, Semiconducting wafers, Optical proximity correction, Lithography, Optical lithography, Resolution enhancement technologies

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Proceedings Article | 20 August 2004 Paper

The study of phase angle effects to wafer process window using 193-nm EAPSM in a 300-mm wafer manufacturing environment

William Chou, Shih Yen, J. Wu, W. Shieh, Mars Chuang, George Fan, Chin Chih Tseng, Gregory Hughes, Susan MacDonald, Carrie Holiday, Gong Chen

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557754

KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Printing, Etching, Wafer manufacturing, Quartz, 193nm lithography, Scanners, Computer simulations

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Proceedings Article | 2 June 2000 Paper

Feature integrity monitoring for process control using a CD SEM

John Allgair, Gong Chen, Stephen Marples, David Goodstein, John Miller, Frank Santos

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386475

KEYWORDS: Etching, Process control, Line scan image sensors, Critical dimension metrology, Image processing, Inspection, Scanning electron microscopy, Image analysis, Image quality, Cadmium

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Proceedings Article | 13 May 1994 Paper

X-ray lithography processing at CXrL from beamline to quarter-micron NMOS devices

Ramez Nachman, Gong Chen, Michael Reilly, Gregory Wells, John Wallace, Hsin Li, Azalia Krasnoperova, Paul Anderson, Eric Brodsky, Eti Ganin, Stephen Campbell, James Taylor, Franco Cerrina

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175835

KEYWORDS: Photomasks, Semiconducting wafers, Optical alignment, X-rays, X-ray lithography, Mirrors, Coating, Beryllium, X-ray optics, Aluminum

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Showing 5 of 10 publications

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