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Dr. Henning Stoschus
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Publications (1)
Proceedings Article | 22 February 2021 Presentation + Paper
High voltage scanning electron microscope overlay metrology accuracy for after development inspection
S. Czerkas, N. Gutman, R. Gronheid, E. Gurevich, R. Wang, Y. Feler, M. Zaberchik, Y. Grauer, H. Stoschus, Y. Uziel, U. Pohlmann, F. Laske
Proceedings Volume 11611, 116110B (2021) https://doi.org/10.1117/12.2583710
KEYWORDS: Overlay metrology, Scanning electron microscopy, Inspection, Electron microscopes, Optical metrology, Optical lithography, New and emerging technologies, Metrology, Integrated optics, Imaging metrology
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