Mr. Jacob Sitterly Profile

Jacob Sitterly

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Publications (6)

Proceedings Article | 30 April 2023 Poster

Manipulation of polymer solubility: crosslinking, thermal activation and variable-temperature bakes

Jacob Sitterly, Justin Nhan, Robert Brainard

Proceedings Volume 12498, 124981X (2023) https://doi.org/10.1117/12.2659165

KEYWORDS: Polymers

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Proceedings Article | 30 April 2023 Presentation

Switching the solubility of polymers using intermolecular reactions and diffusion of small molecules

Jacob Sitterly, Justin Nhan, Moira Niluxsshun, Stephen Smith, Robert Brainard

Proceedings Volume 12498, 124980V (2023) https://doi.org/10.1117/12.2659167

KEYWORDS: Switching, Polymers, Molecules

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Modeling the acid-catalyzed cleavage of carbon-oxygen bonds

Justin Nhan, Jacob Sitterly, Robert Brainard

Proceedings Volume 11612, 1161210 (2021) https://doi.org/10.1117/12.2583013

KEYWORDS: Photoresist materials, Ions, Polymers, Lithography, Extreme ultraviolet lithography, Deep ultraviolet, Amplifiers

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Proceedings Article | 27 March 2018 Paper

Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn)

Jacob Sitterly, Michael Murphy, Steven Grzeskowiak, Greg Denbeaux, Robert Brainard

Proceedings Volume 10586, 105861P (2018) https://doi.org/10.1117/12.2316333

KEYWORDS: Tellurium, Antimony, Bismuth, Extreme ultraviolet lithography, Metals, Carbon monoxide, Extreme ultraviolet, Chromium, Semiconducting wafers, Photoresist materials

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Proceedings Article | 27 March 2018 Paper

Mechanisms of photodecomposition of metal-containing EUV photoresists: isotopic labelling studies

Michael Murphy, Jacob Sitterly, Steven Grzeskowiak, Greg Denbeaux, Robert Brainard

Proceedings Volume 10586, 1058608 (2018) https://doi.org/10.1117/12.2298418

KEYWORDS: Hydrogen, Extreme ultraviolet lithography, Photoresist materials, Antimony, Extreme ultraviolet, Semiconducting wafers, Spectroscopy, Carbon monoxide, Chromium, Molecules

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Proceedings Article | 31 March 2017 Presentation + Paper

Antimony photoresists for EUV lithography: mechanistic studies

Michael Murphy, Amrit Narasimhan, Steven Grzeskowiak, Jacob Sitterly, Philip Schuler, Jeff Richards, Greg Denbeaux, Robert Brainard

Proceedings Volume 10143, 1014307 (2017) https://doi.org/10.1117/12.2258119

KEYWORDS: Extreme ultraviolet lithography, Antimony, Extreme ultraviolet, Photoresist materials, Photons, Polymerization, Chemical elements, Manufacturing, Metals, Hydrogen, Molecules, Electrons, Spectroscopy, Semiconducting wafers

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Showing 5 of 6 publications

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