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Philip Schuler
at IPG Photonics Corp
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Publications (1)
Proceedings Article | 31 March 2017 Presentation + Paper
Antimony photoresists for EUV lithography: mechanistic studies
Michael Murphy, Amrit Narasimhan, Steven Grzeskowiak, Jacob Sitterly, Philip Schuler, Jeff Richards, Greg Denbeaux, Robert Brainard
Proceedings Volume 10143, 1014307 (2017) https://doi.org/10.1117/12.2258119
KEYWORDS: Extreme ultraviolet lithography, Antimony, Extreme ultraviolet, Photoresist materials, Photons, Polymerization, Chemical elements, Manufacturing, Metals, Hydrogen, Molecules, Electrons, Spectroscopy, Semiconducting wafers
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