Mr. Jason Aaron Plumhoff Profile

Jason Aaron Plumhoff

Business Unit Manager of Photomask at Oerlikon USA Inc

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Publications (20)

Proceedings Article | 19 May 2008 Paper

Phase shift mask etch process development utilizing a scatterometry-based metrology tool

Jason Plumhoff, Alexander Gray

Proceedings Volume 7028, 702807 (2008) https://doi.org/10.1117/12.793016

KEYWORDS: Etching, Quartz, Chromium, Phase shifts, Reflectivity, Metrology, Scatterometry, Atomic force microscopy, Standards development, Time metrology

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Proceedings Article | 20 October 2006 Paper

Controlling CD uniformity for 45nm technology node applications

J. Plumhoff, S. Srinivasan, R. Westerman, D. Johnson, C. Constantine

Proceedings Volume 6349, 63490A (2006) https://doi.org/10.1117/12.686390

KEYWORDS: Etching, Photomasks, Chromium, Binary data, Critical dimension metrology, Plasma, Control systems, Ions, Lithography

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Proceedings Article | 20 May 2006 Paper

Binary Cr etch process control directed at the 45nm node

J. Plumhoff, R. Westerman, C. Constantine

Proceedings Volume 6283, 62831U (2006) https://doi.org/10.1117/12.681757

KEYWORDS: Etching, Chromium, Genetic algorithms, Signal processing, Plasma, Photomasks, Signal to noise ratio, Plasma etching, Sensors, Reflectivity

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Proceedings Article | 28 June 2005 Paper

Quartz etch process for alternating aperture phase shift masks (alt-APSM)

Sunil Srinivasan, Russ Westerman, Jason Plumhoff, Dave Johnson, Chris Constantine

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617095

KEYWORDS: Etching, Quartz, Photomasks, Phase shifts, Chromium, Chemistry, Dry etching, Plasma, Scanning electron microscopy, Photoresist processing

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Proceedings Article | 6 December 2004 Paper

Quartz etch process to improve etch depth linearity and uniformity using Mask Etcher IV

Sunil Srinivasan, Jason Plumhoff, Russ Westerman, Dave Johnson, Chris Constantine

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.571468

KEYWORDS: Etching, Photomasks, Quartz, Scanning electron microscopy, Reactive ion etching, Phase shifts, Dry etching, Lithography, Manufacturing, Surface roughness

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Proceedings Article | 20 August 2004 Paper

Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024

Mathias Irmscher, Dirk Beyer, Joerg Butschke, Peter Hudek, Corinna Koepernik, Jason Plumhoff, Emmanuel Rausa, Mitsuru Sato, Peter Voehringer

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557686

KEYWORDS: Etching, Opacity, Photoresist processing, Chromium, Scattering, Electron beam lithography, Photomasks, Optical lithography, Calibration, Chemically amplified resists

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Proceedings Article | 20 August 2004 Paper

Alternating aperture phase shift mask process using e-beam lithography for the second level

Corinna Koepernik, Joerg Butschke, Dirk Beyer, Mathias Irmscher, Bernd Leibold, Emmanuel Rausa, Rainer Plontke, Jason Plumhoff, Peter Voehringer

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557719

KEYWORDS: Overlay metrology, Photomasks, Etching, Electron beam lithography, Quartz, Scanning electron microscopy, Phase shifts, Lithography, Thin film coatings, Microsystems

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Proceedings Article | 20 August 2004 Paper

Achieving 65-nm design rule dry etch performance: a study of CD bias, uniformity, and linearity on binary chrome photomasks

Jason Plumhoff, Chris Constantine, Brad Reelfs

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557706

KEYWORDS: Etching, Photomasks, Reactive ion etching, Chromium, Critical dimension metrology, Dry etching, Optical proximity correction, Binary data, Photoresist materials, Lithography

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Proceedings Article | 17 December 2003 Paper

Improvements in binary chrome CD performance utilizing an optimized 4th-generation reactor platform

Jason Plumhoff, Chris Constantine, Jong Shin, Brad Reelfs, Emmanuel Rausa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518138

KEYWORDS: Reactive ion etching, Etching, Chromium, Photomasks, Neodymium, Plasma, Dry etching, Binary data, Diffractive optical elements, Standards development

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Proceedings Article | 17 December 2003 Paper

90-nm mask making processes using the positive tone chemically amplified resist FEP171

Joerg Butschke, Dirk Beyer, Chris Constantine, Peter Dress, Peter Hudek, Mathias Irmscher, Corinna Koepernik, Christian Krauss, Jason Plumhoff, Peter Voehringer

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518043

KEYWORDS: Opacity, Mask making, Electron beam lithography, Photoresist processing, Etching, Chemically amplified resists, Optical proximity correction, Line edge roughness, Photomasks, Scattering

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Proceedings Article | 28 August 2003 Paper

Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes

Jason Plumhoff, Chris Constantine, Jong Shin, B. Reelfs, Emmanuel Rausa, Jason Benz, Michael Hibbs, Timothy Brunner

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504198

KEYWORDS: Etching, Quartz, Photomasks, Image processing, Diffractive optical elements, Dry etching, Phase shifts, Surface roughness, Scanning electron microscopy, Chromium

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Proceedings Article | 27 December 2002 Paper

Improving feature-size linearity for alternating phase-shift mask applications utilizing a next-generation ICP source

Jong Shin, Chris Constantine, Jason Plumhoff, Emmanuel Rausa

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467580

KEYWORDS: Etching, Photomasks, Quartz, Reactive ion etching, Chromium, Deep ultraviolet, Manufacturing, Oxygen, Plasma, Phase shifts

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Proceedings Article | 27 December 2002 Paper

Comparison of endpoint methods in advanced photomask etch applications

David Johnson, Jason Plumhoff, Jong Shin, Emmanuel Rausa

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467749

KEYWORDS: Chromium, Etching, Spectroscopy, Signal processing, Plasma, Electronic filtering, Sinc filters, Photomasks, Sensors, Reflectivity

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Proceedings Article | 1 August 2002 Paper

Improvements in MoSi EAPSM CD bias and iso-dense linearity plasma etch results utilizing design of experiments process optimization of Gen III ICP plasma source

Jason Plumhoff, Chris Constantine, J. Shin, Emmanuel Rausa

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476973

KEYWORDS: Etching, Quartz, Reactive ion etching, Photomasks, Diffractive optical elements, Plasma etching, Plasma, Chromium, Chemistry, Scanning electron microscopy

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Proceedings Article | 11 March 2002 Paper

Investigation of MoSi etch processes for embedded attenuating phase shift mask applications utilizing a next-generation ICP source

Jason Plumhoff, Chris Constantine, C. Strawn, J. Shin

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458282

KEYWORDS: Etching, Quartz, Diffractive optical elements, Photomasks, Critical dimension metrology, Plasma, Plasma etching, Reactive ion etching, Scanning electron microscopy, Phase shifts

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Proceedings Article | 9 April 2001 Paper

Investigation of quartz etch rate uniformity for alternating phase-shift mask applications utilizing a next-generation ICP source

C. Strawn, Chris Constantine, Jason Plumhoff, Russell Westerman

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425099

KEYWORDS: Etching, Quartz, Photomasks, Phase shifts, Plasma, Dry etching, Electroluminescence, Surface roughness, Optical lithography, Lithography

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Proceedings Article | 22 January 2001 Paper

Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads: III

Chris Constantine, Russell Westerman, Jason Plumhoff

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410745

KEYWORDS: Chromium, Etching, Plasma, Plasma etching, Photomasks, Binary data, Diffusion, Systems modeling, Finite element methods, Data modeling

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Proceedings Article | 22 January 2001 Paper

Plasma etching of quartz for the fabrication of alternating aperture phase-shift photomasks: etch rate uniformity study utilizing a next-generation ICP source

Russell Westerman, Chris Constantine, Jason Plumhoff, C. Strawn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410708

KEYWORDS: Etching, Quartz, Plasma, Plasma etching, Photomasks, Phase shifts, Dry etching, Lithium, Surface roughness, Lithography

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Proceedings Article | 30 December 1999 Paper

Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads

Chris Constantine, Russell Westerman, Jason Plumhoff

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373288

KEYWORDS: Chromium, Etching, Plasma, Plasma etching, Photomasks, Binary data, Dry etching, Reticles, Wet etching, Ions

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Proceedings Article | 25 August 1999 Paper

Plasma etching of Cr: a multiparameter uniformity study utilizing patterns of various Cr loads

Chris Constantine, Russell Westerman, Jason Plumhoff

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360203

KEYWORDS: Chromium, Etching, Plasma etching, Photomasks, Plasma, Photoresist processing, Optical proximity correction, Dry etching, Diffractive optical elements, Binary data

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Showing 5 of 20 publications

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