Mr. Jin-Sik Jung Profile

Jin-Sik Jung

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 20 October 2008 Paper

A new paradigm for haze improvement: retardation of haze occurrence by creating mask substrate insensitive to chemical contamination level

Han-Shin Lee, Jaehyuck Choi, Jin-Sik Jung, Jong-Keun Oh, Soo-Jung Kang, Hae-Young Jeong, Sang-Gyun Woo, HanKu Cho

Proceedings Volume 7122, 712217 (2008) https://doi.org/10.1117/12.801422

KEYWORDS: Air contamination, Ions, Resistance, Sulfur, Photomasks, Contamination, Transmittance, Surface roughness, Chemical analysis, Molecules

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Proceedings Article | 19 May 2008 Paper

Prevention of chemical residue from growing into Haze defect on PSM pattern edge after normal cleaning process

Jaehyuck Choi, Jin-sik Jung, Han-shin Lee, Jongkeun Oh, Soojung Kang, Haeyong Jeong, Yonghoon Kim, HanKu Cho

Proceedings Volume 7028, 702818 (2008) https://doi.org/10.1117/12.793049

KEYWORDS: Air contamination, Ions, Oxides, Photomasks, Industrial chemicals, Profiling, Sulfur, Scanning probe microscopy, Information operations, Silica

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Proceedings Article | 29 May 2007 Paper

Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition

Jaehyuck Choi, Han-shin Lee, Jin-sik Jung, Byung Cheol Cha, Sang-Gyun Woo, HanKu Cho

Proceedings Volume 6607, 660709 (2007) https://doi.org/10.1117/12.728922

KEYWORDS: Ions, Air contamination, Chromium, Sulfur, Profiling, Photomasks, Molybdenum, Surface roughness, Chemical analysis, Industrial chemicals

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Proceedings Article | 14 May 2007 Paper

Optical performance enhancement technique for 45-nm node with binary mask

Jin-Sik Jung, Hee-Bom Kim, Jeung-Woo Lee, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 6607, 66071I (2007) https://doi.org/10.1117/12.728965

KEYWORDS: Oxides, Photomasks, Nanoimprint lithography, Binary data, Resolution enhancement technologies, Etching, Manufacturing, Chromium, Diffraction, Phase shifts

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Proceedings Article | 27 March 2007 Paper

Optical performance enhancement technique for 45-nm-node with binary mask

Jin-Sik Jung, Hee-Bom Kim, Jeung-Woo Lee, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 6520, 652026 (2007) https://doi.org/10.1117/12.711328

KEYWORDS: Oxides, Nanoimprint lithography, Binary data, Manufacturing, Etching, Optics manufacturing, Chromium, Diffraction, Phase shifts, Near field

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