Mr. Juhwan Kim Profile

Juhwan Kim

Sr. Dir. of Advanced Technology Deployment at Siemens EDA

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Author

Publications (13)

Proceedings Article | 20 March 2018 Presentation + Paper

Model-assisted template extraction SRAF application to contact holes patterns in high-end flash memory device fabrication

Ahmed Seoud, Juhwan Kim, Yuansheng Ma, Srividya Jayaram, Le Hong, Gyu-Yeol Chae, Jeong-Woo Lee, Dae-Jin Park, Hyoung-Soon Yune, Se-Young Oh, Chan-Ha Park

Proceedings Volume 10587, 105870L (2018) https://doi.org/10.1117/12.2297659

KEYWORDS: SRAF, Lithography, Optical proximity correction, Optical lithography

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Proceedings Article | 20 March 2018 Presentation + Paper

Model based cell-array OPC development for productivity improvement in memory device fabrication

Ahmed Seoud, Sherif Hany, Juhwan Kim, Jebum Yoon, Boram Jung, Sang-Jin Oh, Byoung-Sub Nam, Seyoung Oh, Chan-Ha Park

Proceedings Volume 10587, 105870K (2018) https://doi.org/10.1117/12.2297638

KEYWORDS: Optical proximity correction, Lithography, SRAF, Semiconducting wafers, Photomasks, Manufacturing, Computer simulations

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Proceedings Article | 13 March 2012 Paper

Full-chip correction of implant layer accounting for underlying topography

Minchul Oh, Hyungjoo Youn, Noyoung Chung, Jaeyeol Maeng, Sukjoo Lee, Jahum Ku, Aasutosh Dave, John Sturtevant, Uwe Hollerbach, Thuy Do, Yuri Granik, Kostas Adam, Juhwan Kim, Cynthia Zhu, S. W. Jung

Proceedings Volume 8326, 83262R (2012) https://doi.org/10.1117/12.917984

KEYWORDS: Photomasks, Optical proximity correction, Oxides, Critical dimension metrology, Semiconducting wafers, Reflectivity, Calibration, Data modeling, Model-based design, Photoresist materials

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Proceedings Article | 4 March 2010 Paper

Optical proximity correction enhancement by using model based fragmentation approaches

Young-Seok Woo, Woon-Hyuk Choi, Beom-Seok Seo, Yoo-Hyon Kim, Vladislav Liubich, Shady Abdelwahed, Juhwan Kim, James Word, Jong-Won Lee

Proceedings Volume 7640, 76401F (2010) https://doi.org/10.1117/12.848447

KEYWORDS: Optical proximity correction, Lithography, Optical lithography, Critical dimension metrology, Bridges, Resolution enhancement technologies, Semiconducting wafers, Lithographic illumination, Tolerancing, Computer simulations

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Proceedings Article | 17 October 2008 Paper

Pixel-based SRAF implementation for 32nm lithography process

Byung-Sung Kim, Yoo-Hyun Kim, Sung-Ho Lee, Sung-Il Kim, Sang-Rok Ha, Juhwan Kim, Alexander Tritchkov

Proceedings Volume 7122, 71220T (2008) https://doi.org/10.1117/12.801310

KEYWORDS: SRAF, Photomasks, Manufacturing, Optical proximity correction, Lithography, Photovoltaics, Semiconducting wafers, Double patterning technology, Image enhancement, Logic

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Proceedings Article | 8 November 2005 Paper

Full-chip level MEEF analysis using model based lithography verification

Juhwan Kim, Lantian Wang, Daniel Zhang, Zongwu Tang

Proceedings Volume 5992, 59922U (2005) https://doi.org/10.1117/12.632019

KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Optical lithography, Semiconducting wafers, Bridges, Data modeling, Optical proximity correction, Process modeling, Error analysis

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Proceedings Article | 5 November 2005 Paper

Full-chip poly gate critical dimension control using model based lithography verification

Daniel Zhang, Juhwan Kim, Lantian Wang, Zongwu Tang

Proceedings Volume 5992, 59925E (2005) https://doi.org/10.1117/12.632302

KEYWORDS: Critical dimension metrology, Photomasks, Optical proximity correction, Lithography, Error analysis, Semiconducting wafers, Data modeling, Control systems, Model-based design, Tolerancing

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Proceedings Article | 28 June 2005 Paper

Contact CD variation check and contact/metal overlay check using a model based full chip verification software tool

Lantian Wang, Juhwan Kim, Daniel Zhang, Zongwu Tang, Minghui Fan

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617139

KEYWORDS: Critical dimension metrology, Optical proximity correction, Overlay metrology, Error analysis, Metals, Photomasks, Semiconducting wafers, Tolerancing, Data modeling, Resolution enhancement technologies

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Proceedings Article | 28 June 2005 Paper

Model-based full-chip verification for 65nm lithography process development

Juhwan Kim, Lantian Wang, Daniel Zhang, Zongwu Tang

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617141

KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Optical proximity correction, Resolution enhancement technologies, Data modeling, Optical lithography, Metals, Model-based design, Systems modeling

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Proceedings Article | 6 December 2004 Paper

Resolution enhancement technique optimization using model-based full-chip verification methodology for subwavelength lithography

Juhwan Kim, Minghui Fan, Lantian Wang, Timothy Tsuei, Zongwu Tang

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569294

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Data modeling, Lithography, Optical lithography, Process modeling, Photomasks, Error analysis, Critical dimension metrology, Bridges

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Proceedings Article | 17 December 2003 Paper

Hotspot detection on post-OPC layout using full-chip simulation-based verification tool: a case study with aerial image simulation

Juhwan Kim, Minghui Fan

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517364

KEYWORDS: Semiconducting wafers, Calibration, Optical proximity correction, Printing, Process modeling, Bridges, Wafer-level optics, Data modeling, Error analysis, Photomasks

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Proceedings Article | 22 January 2001 Paper

KrF attenuated PSM defect printability and detectability for 120-nm actual DRAM patterning process

Juhwan Kim, Sang-Chul Kim, Hee-Chun Kim, Sang-Lee Lee, Yong-Kyoo Choi, Young-Mog Ham, Oscar Han

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410705

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Optical lithography, Quartz, Printing, Opacity, Defect detection, Lithography, Defect inspection

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Proceedings Article | 2 June 2000 Paper

Alternating PSM phase defect printability for 100-nm KrF lithography

Juhwan Kim, Wang Pen Mo, Ronald Gordon, Alvina Williams

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386486

KEYWORDS: Semiconducting wafers, Printing, Photomasks, Image processing, 3D image processing, Photoresist processing, Scanning electron microscopy, Optical lithography, Mask making, Lithography

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Showing 5 of 13 publications

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