Mr. Keiichi Hatta Profile

Keiichi Hatta

at NEC Corp

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 29 May 2007 Paper

High-performance reticle inspection tool for the 65-nm node and beyond

Tung-Yaw Kang, Chia-Hsien Chen, Chia Hui Ho, Luke Hsu, Yao-Ching Ku, Kazuyoshi Nakamura, Hideyuki Moribe, Takeshi Bashomatsu, Kenichi Matsumura, Keiichi Hatta, Hiroyuki Takahashi, Akira Uehara, Takahiro Igeta, Hiroshi Uno, Ryou Igarashi, Hiroaki Matsuda

Proceedings Volume 6607, 660716 (2007) https://doi.org/10.1117/12.728955

KEYWORDS: Inspection, Reticles, Photomasks, Semiconducting wafers, Defect detection, Particles, Defect inspection, Sensors, Deep ultraviolet, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 17 December 2003 Paper

DUV inspection capability for 90-nm node mask in ArF lithography

Katsumi Ohira, Byung Gook Kim, Keishi Tanaka, Nobuyuki Yoshioka, Motonari Tateno, Naohisa Takayama, Shingo Murakami, Keiichi Hatta, Shinji Akima, Fuyuhiko Matsuo, Masao Otaki

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518293

KEYWORDS: Inspection, Photomasks, Lithography, Optical proximity correction, Deep ultraviolet, Semiconducting wafers, Binary data, Phase shifts, Chromium, Point spread functions

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography

Motonari Tateno, Naohisa Takayama, Shingo Murakami, Keiichi Hatta, Shinji Akima, Fuyuhiko Matsuo, Masao Otaki, Byung-Gook Kim, Keishi Tanaka, Nobuyuki Yoshioka

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504206

KEYWORDS: Inspection, Photomasks, Optical proximity correction, Lithography, Binary data, Deep ultraviolet, Reticles, Databases, Detection and tracking algorithms, Algorithm development

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Inspectability and lithographic effects of reticle defects under the aggressive OPC environment

Byung Gook Kim, Keishi Tanaka, Nobuyuki Yoshioka, Keiichi Hatta, Masao Otaki

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467902

KEYWORDS: Optical proximity correction, Inspection, Photomasks, Lithography, Critical dimension metrology, Semiconducting wafers, Chromium, Reticles, 193nm lithography, Defect detection

Read Abstract +

Proceedings Article | 1 August 2002 Paper

Required performances of reticle inspection system for ArF lithography through analysis of defect printability study

Byung Gook Kim, Keishi Tanaka, Nobuyuki Yoshioka, Naohisa Takayama, Keiichi Hatta, Shingo Murakami, Masao Otaki

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476960

KEYWORDS: Inspection, Reticles, Lithography, Semiconductors, Photomasks, 193nm lithography, Halftones

Read Abstract +

Proceedings Article | 5 September 2001 Paper

LM5000 as a strong mask analyzing tool

Hisashi Shiba, Masayoshi Kimura, Y. Saito, Naohisa Takayama, K. Matsumura, Shingo Murakami, Keiichi Hatta

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438372

KEYWORDS: Inspection, Image processing, Algorithm development, Reticles, Photomasks, Human-machine interfaces, Defect detection, Standards development, Computer aided design, Data conversion

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years