Dr. Mewael Giday Sertsu
R &D staff at Rigaku Innovative Technology, Inc.
SPIE Involvement:
Author
Area of Expertise:
Thin film and multilayer coatings , EUV and X-ray optics , EUV scattering as a surface technique , Vacuum instrumentation , Radiation damage analysis , Nanomagnetics on hetrostructure multilayers
Profile Summary

I studies Physics and Photonics in my bachelor and masters programs. After 3 years of physics undergraduate teaching, I pursued a PhD research on EUV and X-ray optics. I have done research on thin film and multilayer coatings of high reflectivity performances in EUV and soft X-ray wavelengths. A major task ,however, was to come up with sensitive and reliable metrology techniques to characterize the interdiffuion of multilayers. A grazing incidence based EUV reflectometry was proposed as robust technique to derive structural, optical and chemical properties interdiffuion layers in multilayers.

Deposition of B4C/Ceo2 MLs to study the performance as a possible candidate for the 6.x nm beyond EUV lithogrpahy was performed. optical properties of ceo2 determined experimentally in this range for the first time, interdiffusion of B4C/Ceo2 investigated, and ways of optimizing deposition of such combinations are reccommended for future work. I have worked also on tabletop EUV scattering experiments as surface techniques based on high-brightness DPP sources. A prototype of such tabletop EUV scattering was attempted to study surface morphology of nanostructures non-destructively and with fast scanning.

Research interests:
- X-ray absorption spectroscopies
- development of magnetic hetrostructure thin films and studying the impacts of interface diffusion , layer thicknesses and depsition qualities on the magnetic properties
- Coating and characterization of oxides
- EUV and X-ray optics related in general
- irradiation damage analysis of thin films or nano structures
Publications (9)

SPIE Journal Paper | 10 April 2021 Open Access
Mewael Giday Sertsu, Andrey Sokolov, Nikolay Chkhalo, Vladimir Polkovnikov, Nikolay Salashchenko, Mikhail Svechnikov, Franz Schäfers
OE, Vol. 60, Issue 04, 044103, (April 2021) https://doi.org/10.1117/12.10.1117/1.OE.60.4.044103
KEYWORDS: Beryllium, Extreme ultraviolet, Reflectivity, Multilayers, Silicon, Absorption, X-rays, Silicon carbide, Molybdenum, Reflectometry

Proceedings Article | 12 July 2019 Open Access Paper
Vania Da Deppo, Sergio Mottini, Giampiero Naletto, Fabio Frassetto, Paola Zuppella, Mewael Sertsu, Marco Romoli, Silvano Fineschi, Ester Antonucci, Gianalfredo Nicolini, Piergiorgio Nicolosi, Daniele Spadaro, Vincenzo Andretta, Marco Castronuovo, Marta Casti, Gerardo Capobianco, Giuseppe Massone, Roberto Susino, Federico Landini, Maurizio Pancrazzi, Chiara Casini, Luca Teriaca, Michela Uslenghi
Proceedings Volume 11180, 1118076 (2019) https://doi.org/10.1117/12.2536177
KEYWORDS: Telescopes, Ultraviolet radiation, Sensors, Mirrors, Coronagraphy, Optical alignment, Ultraviolet telescopes, Polarimetry, Information operations, Alignment procedures

Proceedings Article | 6 August 2018 Paper
Gerardo Capobianco, Marta Casti, Silvano Fineschi, Giuseppe Massone, Mewael Sertsu, Federico Landini, Marco Romoli, Ester Antonucci, Vincenzo Andretta, Giampiero Naletto, Gianalfredo Nicolini, Daniele Spadaro, Alberto Alvarez Herrero, Pilar Garcia Parejo, Matteo Marmonti
Proceedings Volume 10698, 1069830 (2018) https://doi.org/10.1117/12.2323371
KEYWORDS: Calibration, Polarimetry, Wave plates, Liquid crystals, Crystals, Coronagraphy, Polarization, Liquids, Observatories, Modulation

Proceedings Article | 7 September 2017 Paper
F. Eggenstein, M. Krivenkov, I. Rudolph, M. Sertsu, A. Sokolov, A. Varykhalov, J. Wolf, T. Zeschke, F. Schäfers
Proceedings Volume 10385, 1038505 (2017) https://doi.org/10.1117/12.2272967
KEYWORDS: Carbon, Metrology, X-rays, X-ray optics, Optical components, Contamination, Reflectometry, Synchrotron radiation, Scanning tunneling microscopy, Reflectivity

Proceedings Article | 12 May 2015 Paper
Proceedings Volume 9510, 95100Z (2015) https://doi.org/10.1117/12.2178142
KEYWORDS: Thin films, Reflectivity, Extreme ultraviolet, X-rays, Surface roughness, Titanium, Refractive index, Silicon, X-ray optics, Titanium dioxide

Showing 5 of 9 publications
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