Michael D. Tittnich
Director of Technical Operations at IBM Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 13 March 2015 Paper
Proceedings Volume 9422, 94221L (2015) https://doi.org/10.1117/12.2175733
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Lithography, Photoresist materials, Manufacturing, Optical lithography, Semiconducting wafers, Photoresist developing, Photomasks

Proceedings Article | 21 March 2008 Paper
Hans Meiling, Edwin Boon, Nico Buzing, Kevin Cummings, Olav Frijns, Judy Galloway, Mieke Goethals, Noreen Harned, Bas Hultermans, Roel de Jonge, Bart Kessels, Peter Kürz, Sjoerd Lok, Martin Lowisch, Joerg Mallman, Bill Pierson, Kurt Ronse, James Ryan, Emil Smitt-Weaver, Michael Tittnich, Christian Wagner, Andre van Dijk, John Zimmerman
Proceedings Volume 6921, 69210L (2008) https://doi.org/10.1117/12.773259
KEYWORDS: Extreme ultraviolet, Tin, Extreme ultraviolet lithography, Semiconducting wafers, Mirrors, Printing, Sensors, Stray light, Cameras, Reticles

Proceedings Article | 15 March 2007 Paper
O. Wood, D. Back, R. Brainard, G. Denbeaux, D. Goldfarb, F. Goodwin, J. Hartley, K. Kimmel, C. Koay, B. La Fontaine, J. Mackey, B. Martinick, W. Montgomery, P. Naulleau, U. Okoroanyanwu, K. Petrillo, B. Pierson, M. Tittnich, S. Trogisch, T. Wallow, Y. Wei
Proceedings Volume 6517, 65170U (2007) https://doi.org/10.1117/12.714016
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Reticles, Photomasks, Contamination, Reflectivity, Microscopes, Image resolution, Manufacturing, Lithography

Proceedings Article | 13 March 2007 Paper
Noreen Harned, Mieke Goethals, Rogier Groeneveld, Peter Kuerz, Martin Lowisch, Henk Meijer, Hans Meiling, Kurt Ronse, James Ryan, Michael Tittnich, Harm-Jan Voorma, John Zimmerman, Uwe Mickan, Sjoerd Lok
Proceedings Volume 6517, 651706 (2007) https://doi.org/10.1117/12.712065
KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Mirrors, Photomasks, Reflectivity, Tin, Reliability

Proceedings Article | 22 March 2006 Open Access Paper
Proceedings Volume 6151, 615101 (2006) https://doi.org/10.1117/12.663785
KEYWORDS: Nanotechnology, Immersion lithography, Water, Lithography, Semiconductors, Semiconducting wafers, Photoresist developing, Thin film coatings, Scanners, Photoresist materials

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top