Dr. Nikolay A. Artemiev
Research Scientist at KLA Corp
SPIE Involvement:
Author
Area of Expertise:
Optical metrology , Synchrotron radiation , Femtosecond X-ray source , X-ray optics , Compton back scattering X-ray source
Profile Summary

Solid background in conventional visible and synchrotron X-ray instrumentation and optics. Creation of complete experimental setups right from scratch.
Extensive experience performing accurate physical measurements.
Large experience with X-ray synchrotron radiation instrumentation and good knowledge hopes and needs of SR scientists and engineers. Have been working at Siberia-I and Siberia-II synchrotron radiation sources in Moscow, at Elettra synchrotron in Trieste, at the ESRF in Grenoble, at BESSY-II in Berlin, and at Synchrotron Soleil in Saclay.
Large experience with ultrafast and ultra intense lasers, pump-probe experiments.
Broad knowledge of optical and X-ray methods of testing mirrors, crystals and crystal surfaces.
Design and development of complete X-ray experimental setups and instrumentation, X-ray sources, optical schemes and diffraction experiments.
Software development for calculation of various physical phenomena, simulation of experiments and experimental data processing. Large experience in calculation of Compton back scattering. Theoretical and practical experience in the field of X-ray crystal and refractive optics. Practical experience in X-ray measurements of crystal structure perfection, orientation, and interferometric control of surface quality.
Comprehensive knowledge of SR and conventional X-ray and optical instrumentation. Practical skill in planning and controlling experiments, collecting and processing data.
Extensive experience with HV and UHV equipment.
Theoretical and practical knowledge of X-ray and laser physics.
Publications (20)

Proceedings Article | 15 September 2016 Presentation + Paper
D. Voronov, T. Warwick, E. Gullikson, F. Salmassi, P. Naulleau, N. Artemiev, P. Lum, H. Padmore
Proceedings Volume 9963, 996306 (2016) https://doi.org/10.1117/12.2238303
KEYWORDS: Diffraction gratings, Diffraction, X-rays, X-ray diffraction, Etching, Extreme ultraviolet lithography, Monochromators, Plasma etching, Wet etching, Direct write lithography

SPIE Journal Paper | 12 October 2015 Open Access
OE, Vol. 54, Issue 10, 104104, (October 2015) https://doi.org/10.1117/12.10.1117/1.OE.54.10.104104
KEYWORDS: Metrology, X-ray optics, Control systems, Mirrors, Humidity, X-rays, Temperature metrology, Interferometry, Calibration, Particles

Proceedings Article | 1 September 2015 Paper
Proceedings Volume 9576, 957608 (2015) https://doi.org/10.1117/12.2185191
KEYWORDS: Modulation transfer functions, Binary data, Calibration, Spatial frequencies, Standards development, Optical microscopes, Silicon, Error analysis, Sensors, Optical fabrication

Proceedings Article | 17 September 2014 Paper
Proceedings Volume 9206, 92060I (2014) https://doi.org/10.1117/12.2062042
KEYWORDS: Metrology, X-ray optics, Calibration, Mirrors, Humidity, Temperature metrology, Optical testing, Interferometry, Control systems, Particles

Proceedings Article | 17 September 2014 Paper
Ian Lacey, Nikolay Artemiev, Edward Domning, Wayne McKinney, Gregory Morrison, Simon Morton, Brian Smith, Valeriy Yashchuk
Proceedings Volume 9206, 920603 (2014) https://doi.org/10.1117/12.2061969
KEYWORDS: Calibration, X-ray optics, Mirrors, Metrology, Autocollimators, Optical testing, Optical spheres, Light sources, Spherical lenses, Precision calibration

Showing 5 of 20 publications
Conference Committee Involvement (1)
Advances in Laboratory-based X-Ray Sources, Optics, and Applications VII
13 August 2019 | San Diego, California, United States
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