Mr. Ohtaguro Hiroki Profile

Ohtaguro Hiroki

at Tokyo Electron (Shanghai) Ltd

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Publications (1)

Proceedings Article | 23 March 2020 Paper

CD uniformity improvement for sub 20 nm DRAM process with negative tone development

Y. C. Lin, Mifong Wu, Le Wang, Baijun Sun, Hiroki Ohtaguro, Takeshi Shimoaoki, Yusaku Hashimoto, Koichi Hontake

Proceedings Volume 11326, 1132620 (2020) https://doi.org/10.1117/12.2551835

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Image processing, Particles, Manufacturing, Inspection, Photomasks, Arsenic, Extreme ultraviolet lithography, Etching

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