Mr. Paul J. Rudolph Profile

Paul J. Rudolph

Process Control Manager at Broadcom Inc

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Author

Publications (5)

Proceedings Article | 10 March 2006 Paper

Advanced process control of poly-silicon gate critical dimensions

P. Rudolph

Proceedings Volume 6155, 61550B (2006) https://doi.org/10.1117/12.658860

KEYWORDS: Etching, Critical dimension metrology, Process control, Semiconducting wafers, Scanning electron microscopy, Logic, Manufacturing, Control systems, Inspection, Photomasks

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Proceedings Article | 17 May 2005 Paper

Real-time temperature characterization and monitoring as a method of fault isolation

Paul Rudolph, Lindsey Kato

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.600189

KEYWORDS: Semiconducting wafers, Helium, Temperature metrology, Etching, Plasma, Calibration, Critical dimension metrology, Metals, Control systems, Scanning electron microscopy

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Proceedings Article | 17 May 2005 Paper

Oxide etch rate estimation using plasma impedance monitoring

Daniel Tsunami, James McNames, Bruce Whitefield, Paul Rudolph, Jeff Zola

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.599997

KEYWORDS: Etching, Plasma, Semiconducting wafers, Plasma etching, Wafer testing, Statistical analysis, Data modeling, Oxides, Error analysis, Process control

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Proceedings Article | 17 May 2005 Paper

Wafer sampling by regression for systematic wafer variation detection

Byungsool Moon, James McNames, Bruce Whitefield, Paul Rudolph, Jeff Zola

Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.600217

KEYWORDS: Semiconducting wafers, Monte Carlo methods, Inspection, Detection and tracking algorithms, Signal to noise ratio, Manufacturing, Algorithm development, Statistical analysis, Sensors, Semiconductor manufacturing

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Proceedings Article | 10 May 2005 Paper

Improved shallow trench isolation and gate process control using scatterometry based metrology

P. Rudolph, S. Bradford

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600199

KEYWORDS: Scatterometry, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Metrology, Process control, Scatter measurement, Oxides, Logic, Reflectometry

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