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Ray Xu
at KLA Corp
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Publications (1)
Proceedings Article | 10 April 2024 Poster + Paper
Advanced pattern-centric solutions for R&D and HVM applications
Ray Xu, Zhijin Chen, Chenwei Gong, Di Yin, Khurram Zafar, Kaushik Sah
Proceedings Volume 12955, 129553R (2024) https://doi.org/10.1117/12.3015164
KEYWORDS: Line edge roughness, Semiconducting wafers, Design, Defect detection, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Diffractive optical elements, High volume manufacturing, Bridges
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