Mr. Ron Schuurhuis Profile

Ron Schuurhuis

at ASML

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 22 February 2021 Presentation

0.33 NA EUV systems for high-volume manufacturing

Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie Van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Klaus Hummler, Roderik Van Es

Proceedings Volume 11609, 1160908 (2021) https://doi.org/10.1117/12.2583992

KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Stochastic processes, Scanners, Overlay metrology, Logic, Lithography, Critical dimension metrology

Read Abstract +

Proceedings Article | 22 September 2020 Presentation

0.33 NA EUV systems for High Volume Manufacturing

Eric Verhoeven, Ron Schuurhuis, Marcel Mastenbroek, Peter Jonkers, Frank Bornebroek, Arthur Minnaert, Harrie van Dijck, Parham Yaghoobi, Geert Fisser, Payam Tayebati, Martijn Leenders, Roderik van Es

Proceedings Volume 11517, 1151703 (2020) https://doi.org/10.1117/12.2572356

KEYWORDS: High volume manufacturing, Extreme ultraviolet, Logic devices, Manufacturing, Scanners, Lithography, Logic, Overlay metrology, Critical dimension metrology, Stochastic processes

Read Abstract +

Proceedings Article | 24 May 2004 Paper

Overlay advanced process control for foundry application

Xudong Wan, Andy Zhou, Fjord Zhang, Jerry Li, Xiaolan Gu, Evert Mos, Aernout Kisteman, Vivien Wang, Ron Schuurhuis

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.547586

KEYWORDS: Overlay metrology, Process control, Data modeling, Semiconducting wafers, Control systems, Metals, Computer simulations, Databases, Manufacturing, Phase modulation

Read Abstract +

Proceedings Article | 22 August 2001 Paper

Extended ATHENA alignment performance and application for the 100-nm technology node

Ramon Navarro, Stefan Keij, Arie den Boef, Sicco Schets, Frank van Bilsen, Geert Simons, Ron Schuurhuis, Jaap Burghoorn

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436795

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Phase modulation, Sensors, Diffraction, Lithography, Phase shift keying, Modulators, Aluminum

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years