Rory de Zanger
at TNO
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11147, 1114706 (2019) https://doi.org/10.1117/12.2536531
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Pellicles, Temperature metrology, Mirrors, Contamination, Ruthenium

Proceedings Article | 27 June 2019 Open Access Paper
Chien-Ching Wu, Markus Bender, Rik Jonckheere, Frank Scholze, Herman Bekman, Michel van Putten, Rory de Zanger, Rob Ebeling, Jeroen Westerhout, Kyri Nicolai, Jacqueline van Veldhoven, Véronique de Rooij-Lohmann, Olaf Kievit, Alex Deutz
Proceedings Volume 11178, 111780E (2019) https://doi.org/10.1117/12.2537734
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Scanners, Reflectivity, Oxidation, Ruthenium

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