Dr. Salman Mokhlespour
Lithography System Performance Architect at ASML
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 129551Y (2024) https://doi.org/10.1117/12.3006277
KEYWORDS: Line edge roughness, Line width roughness, Semiconducting wafers, Scanning electron microscopy, Distortion, Stochastic processes, Metrology, Bias correction, Error analysis

Proceedings Article | 20 March 2018 Paper
Brennan Peterson, Rich Wise, Koen van der Straten, Katja Viantka, Melisa Luca, Salman Mokhlespour, Michael Kubis, Giordano Cattani, David Hellin, Daniel Sobieski, Girish Dixit, Nader Shamma, Vito Rutigliani, Patrick Jaenen, Sandip Halder, Philippe Leray
Proceedings Volume 10586, 105860A (2018) https://doi.org/10.1117/12.2297401
KEYWORDS: Etching, Critical dimension metrology, Line width roughness, Lithography, Line edge roughness, Stochastic processes, Semiconducting wafers, Optical lithography, Photomasks, Extreme ultraviolet

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