Die-to-database inspection of optical patterned masks enables defect detection and subsequent repair for creation of defect-free masks regardless of single- or multi-die layout. The components required for optical die-to-database inspection include (1) optical photomask inspection tool with sufficient resolution to resolve the patterns of interest, (2) computational resources for (a) preparation of mask pattern data + (b) algorithms for detection and noise reduction to distinguish real defects from background variation, and (3) network and storage infrastructure to tie it all together. In this paper, we will present the first implementation of the die-to-database inspection flow on the MATRICS tool. To maximize tool utility, the system architecture decouples tool and compute resources, such that non-die-to-database inspections can proceed while die-to-database inspection also remains underway. Details of the mask pattern data preparation will be presented alongside real examples of detection capability from an Intel mask shop.
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