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Scott Beatty
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Publications (1)
Proceedings Article | 22 February 2021 Presentation + Paper
Statistical process optimization method for metrology equipment
Dongsoo Kim, Moran Zaberchik, Chen Li, Honggoo Lee, Chanha Park, Sangho Lee, Dongyoung Lee, Scott Beatty, Jae Park, Ramkumar Karur-Shanmugam, Telly Koffas, Dohwa Lee, Sanghuck Jeon, Dongsub Choi, Efi Megged, Nir BenDavid, Hedvi Spielberg
Proceedings Volume 11611, 1161123 (2021) https://doi.org/10.1117/12.2583638
KEYWORDS: Optimization (mathematics), Metrology, Semiconducting wafers, Statistical methods, Statistical analysis, Time metrology, Overlay metrology, Diffractive optical elements
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