Ms. Soo-Kyung Kim Profile

Soo-Kyung Kim

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 28 June 2005 Paper

Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing

Sook-Kyeong Kim, Byung-Gook Kim, Seong-Yong Moon, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617092

KEYWORDS: Raster graphics, Control systems, Etching, Photomasks, Photoresist processing, Manufacturing, Chemically amplified resists, Vestigial sideband modulation, Modulation, Beam shaping

Read Abstract +

CAR(Chemically amplified resist) is widely used in 50keV VSB (Variable Shaped Beam) e-beam process in photomask manufacturing due to its advantage of high sensitivity which gives to reduced writing time compared to non-CAR. The 10kV raster e-beam system, however, is spread out already worldwide and plays a important role till now in middle grade mask-making. Conventionally the non-CAR like ZEP7000 has been applied to the 10kV raster e-beam system and it gives good performance for raster scan e-beam system. In mass production, sometimes, maintaining two kinds of resist simultaneously of CAR and non-CAR are inefficient strategy to the mask house which has limited resources. This situation makes the authors to apply CAR to the 10kV raster e-beam process. Generally, the grid of 10kV raster e-beam(MEBES) is large and limited compared to the current VSB grid. Historically, many layout data is designed already based on the large limited grid and this gives to limited sizing value. Moreover, it is difficult to control exposure dose in raster e-beam system and control bias with develop time in CAR process. These situations make more difficult CAR application to raster e-beam system under the simple mask data preparation strategy. In this paper, some critical problems will be discussed in isofocal process making for raster scan e-beam system. Advantage and disadvantage will be also discussed through the comparison of basic parameters such as dose margin, develop margin, and the fogging effect between the CAR and non-CAR process in 10kV raster e-beam process.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years