Mr. Sung-Yong Cho Profile

Sung-Yong Cho

Senior Engineer at SAMSUNG Advanced Institute of Technology

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Publications (6)

Proceedings Article | 17 October 2008 Paper

Mask process monitoring with optical CD measurements for sub-50-nm

Kyung-Yoon Bang, Jin-Back Park, Jeong-Hun Roh, Dong-Hoon Chung, Sung-Yong Cho, Yong-Hoon Kim, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 7122, 71222V (2008) https://doi.org/10.1117/12.801416

KEYWORDS: Critical dimension metrology, Chromium, Scatterometry, Ultraviolet radiation, Scanning electron microscopy, Optical testing, Scatter measurement, Atomic force microscopy, Process control, Binary data

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Proceedings Article | 20 October 2006 Paper

CD and profile metrology of EUV masks using scatterometry based optical digital profilometry

Sung-yong Cho, Sanjay Yedur, Michael Kwon, Milad Tabet

Proceedings Volume 6349, 63492I (2006) https://doi.org/10.1117/12.686478

KEYWORDS: Scatterometry, Extreme ultraviolet, Critical dimension metrology, Scanning electron microscopy, Metrology, Photomasks, Etching, EUV optics, Scatter measurement, Inspection

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Proceedings Article | 28 August 2003 Paper

Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Sung-Yong Cho, Won-Suk Ahn, Won-Il Cho, Moon-Gyu Sung, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504055

KEYWORDS: Particles, Inspection, Dry etching, Photomasks, Reticles, Manufacturing, Critical dimension metrology, Scanning electron microscopy, Etching, Chromium

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Proceedings Article | 27 December 2002 Paper

Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Sung-Yong Cho, Won-Suk Ahn, Won-Il Cho, Moon-Gyu Sung, Seong-Yong Moon, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468096

KEYWORDS: Particles, Inspection, Photomasks, Reticles, Dry etching, Manufacturing, Defect inspection, Scanning electron microscopy, Atomic force microscopy, Quartz

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Proceedings Article | 11 March 2002 Paper

Analysis of dry etch loading effect in mask fabrication

Jeong-Yun Lee, Sung-Yong Cho, Chang-Hwan Kim, Sung-Woo Lee, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458341

KEYWORDS: Etching, Chromium, Critical dimension metrology, Photomasks, Oxygen, Plasma etching, Dry etching, Mask making, Plasma, Optical proximity correction

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Proceedings Article | 11 March 2002 Paper

Extended capability of laser writer for masks beyond 180-nm nodes

Sung-Yong Cho, Jeong-Yun Lee, Chang-Hwan Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458290

KEYWORDS: Critical dimension metrology, Photomasks, Photoresist processing, Scanning electron microscopy, Scattering, Standards development, Phase shifts, Semiconducting wafers, Printing, Optics manufacturing

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Showing 5 of 6 publications

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