Dr. William P. Rodrigues
at Applied Materials Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 5 September 2001 Paper
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438370
KEYWORDS: Photomasks, Photoresist processing, Critical dimension metrology, Lithography, Photoresist materials, Deep ultraviolet, Diffusion, Manufacturing, Coating, Process control

Proceedings Article | 24 August 2001 Paper
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436813
KEYWORDS: Etching, Photomasks, Photoresist processing, Deep ultraviolet, Critical dimension metrology, Manufacturing, Coating, Lithography, Semiconducting wafers, Chemistry

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top