Prof. Wim M. J. Coene Profile

Prof. Wim M. J. Coene

Director Research at ASML Netherlands BV

SPIE Involvement:

Author

Proceedings Article | 15 August 2023 Presentation + Paper

Non-isoplanatic lens aberration corrections in digital holographic microscopy

Tamar Cromwijk, Manashee Adhikary, Sander Konijnenberg, Wim Coene, Teus Tukker, Johannes de Boer, Stefan Witte, Arie den Boef

Proceedings Volume 12618, 126180Y (2023) https://doi.org/10.1117/12.2673637

KEYWORDS: Digital holography, Overlay metrology, Aberration correction, Holography, Microscopy, Calibration, Pupil aberrations, Metrology, Semiconductors, Semiconducting wafers

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Proceedings Article | 5 March 2021 Presentation

High repetition rate high harmonic generation with ultra-high photon flux

Maxim Tschernajew, Steffen Haedrich, Robert Klas, Martin Gebhardt, Roland Horsten, Sven Weerdenburg, Sergey Pyatchenkov, Wim Coene, Christian Gaida, Sven Breitkopf, Jan Rothhardt, Tino Eidam, Jens Limpert

Proceedings Volume 11676, 116761C (2021) https://doi.org/10.1117/12.2577496

KEYWORDS: High harmonic generation, Coherence imaging, X-rays, Ultrafast phenomena, Statistical analysis, Laser applications, Fiber lasers, Extreme ultraviolet

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Proceedings Article | 20 September 2020 Presentation + Paper

Refinement strategies for optimal inclusion of prior information in ptychography

Paolo Ansuinelli, Wim Coene, H. Urbach

Proceedings Volume 11517, 1151711 (2020) https://doi.org/10.1117/12.2572019

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Semiconducting wafers, Extreme ultraviolet lithography, Metrology, Silicon, Image resolution, Phase retrieval, Reflectivity

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Proceedings Article | 3 September 2019 Paper

EUV mask feature reconstruction via phase retrieval

Paolo Ansuinelli, Wim Coene, Paul Urbach

Proceedings Volume 11089, 110892F (2019) https://doi.org/10.1117/12.2525976

KEYWORDS: Phase retrieval, Extreme ultraviolet, Photomasks, Inspection, Nanostructures, Coherence imaging, Fourier transforms, Metrology

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Proceedings Article | 26 June 2017 Paper

Ptychographic phase retrieval by applying hybrid input-output (HIO) iterations sequentially

A. Konijnenberg, W. M. Coene, S. Pereira, H. Urbach

Proceedings Volume 10335, 103351I (2017) https://doi.org/10.1117/12.2270227

KEYWORDS: Spatial light modulators, Visible radiation, Coherence imaging, Reconstruction algorithms, Phase retrieval, Computational imaging, X-ray imaging, Far-field diffraction

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Proceedings Article | 18 March 2016 Paper

Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography

Michel Habets, Joni Scholten, Siep Weiland, Wim Coene

Proceedings Volume 9776, 97762D (2016) https://doi.org/10.1117/12.2219168

KEYWORDS: Optical aberrations, Thermal effects, Mirrors, Extreme ultraviolet lithography, Adaptive optics, Deformable mirrors, Projection systems, Actuators, Distortion, Wavefronts, Electroluminescent displays, Thermal modeling

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Proceedings Article | 3 April 2012 Paper

Coherent Fourier scatterometry: tool for improved sensitivity in semiconductor metrology

N. Kumar, O. El Gawhary, S. Roy, V. Kutchoukov, S. Pereira, W. Coene, H. Urbach

Proceedings Volume 8324, 83240Q (2012) https://doi.org/10.1117/12.916357

KEYWORDS: Scatterometry, Metrology, Semiconductors, Diffraction gratings, Sensors, Data modeling, Wavefronts, Charge-coupled devices, Silicon, Collimation

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Proceedings Article | 24 March 2009 Paper

A scatterometry based CD metrology solution for advanced nodes, including capability of handling birefringent layers with uniaxial anisotropy

Chih-Ming Ke, Jimmy Hu, Willie Wang, Jacky Huang, H. Chung, C. R. Liang, Victor Shih, H. H. Liu, H. J. Lee, John Lin, Y. Fan, Tony Yen, Noelle Wright, Ruben Alvarez Sanchez, Wim Coene, Marc Noot, Kiwi Yuan, Vivien Wang, Kaustuve Bhattacharyya, Karel van der Mast

Proceedings Volume 7272, 72723R (2009) https://doi.org/10.1117/12.814909

KEYWORDS: Anisotropy, Semiconducting wafers, Scatterometry, Finite element methods, Critical dimension metrology, Birefringence, Absorption, Refractive index, Carbon, Lithography

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Proceedings Article | 22 June 2006 Paper

A new d=1 k=10 soft-decodable RLL code with r=2 RMTR-constraint and a 2-to-3 PCWA mapping for DC-control

Wim Coene, Andries Hekstra, Bin Yin, Hiroyuki Yamagishi, Makoto Noda, Ariyoshi Nakaoki, Toshihiro Horigome

Proceedings Volume 6282, 62820X (2006) https://doi.org/10.1117/12.685224

KEYWORDS: Computer programming, Signal to noise ratio, Optical recording, Sensors, Near field, Interference (communication), Error control coding, Receivers, Double patterning technology, Error analysis

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Proceedings Article | 9 September 2004 Paper

Adaptation and timing recovery for two-dimensional optical storage

Andre Immink, Jamal Riani, Steven van Beneden, Jan Bergmans, Massimo Ciacci, Ali Nowbakht Irani, Wim Coene, Alexander van der Lee, Dominique Bruls

Proceedings Volume 5380, (2004) https://doi.org/10.1117/12.556915

KEYWORDS: Sensors, Receivers, Optical storage, Signal processing, Compact discs, Electronic filtering, Distortion, Signal detection, Near field optics, Digital video discs

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Proceedings Article | 18 September 2000 Paper

EFMCC: a new combi-code for high-density optical recording

Wim Coene, Ernest Chuang

Proceedings Volume 4090, (2000) https://doi.org/10.1117/12.399364

KEYWORDS: Stochastic processes, Computer programming, Digital video recorders, Information operations, Digital video discs, Lithium, Optical recording, Optical discs, Video, Modulation

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Proceedings Article | 18 September 2000 Paper

Blue phase-change recording at high data densities and data rates

Martijn Dekker, Nicola Pfeffer, Maarten Kuijper, Igolt Ubbens, Wim Coene, E. Meinders, Herman Borg

Proceedings Volume 4090, (2000) https://doi.org/10.1117/12.399363

KEYWORDS: Digital video recorders, Mirrors, Metals, Semiconductor lasers, Optical tracking, Solids, Sensors, Optical storage, Laser development, Optical recording

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Showing 5 of 12 publications

Conference Committee Involvement (3)

Optical Measurement Systems for Industrial Inspection X

26 June 2017 | Munich, Germany

Optical Measurement Systems for Industrial Inspection IX

22 June 2015 | Munich, Germany

Optical Measurement Systems for Industrial Inspection VIII

13 May 2013 | Munich, Germany

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