Xiaohong Zhao
at Beijing Superstring Academy of Memory Technology
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 December 2024 Paper
Proceedings Volume 13423, 134230M (2024) https://doi.org/10.1117/12.3052903
KEYWORDS: Line edge roughness, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Lithography

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