Mr. Yasutoshi Nakagawa Profile

Yasutoshi Nakagawa

Executive Officer at JEOL Ltd

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 25 September 2010 Paper

Improvement of mask write time for curvilinear assist features at 22nm

Aki Fujimura, Ingo Bork, Taiichi Kiuchi, Tadashi Komagata, Yasutoshi Nakagawa, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 7823, 782307 (2010) https://doi.org/10.1117/12.864094

KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Scanning electron microscopy, Vestigial sideband modulation, Printing, Data modeling, Manufacturing, Error analysis, System on a chip

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Proceedings Article | 27 May 2010 Paper

Writing wavy metal 1 shapes on 22-nm logic wafers with less shot count

Harold Zable, Aki Fujimura, Tadashi Komagata, Yasutoshi Nakagawa, John Petersen

Proceedings Volume 7748, 77480X (2010) https://doi.org/10.1117/12.866971

KEYWORDS: Photomasks, Vestigial sideband modulation, Metals, SRAF, Data modeling, Semiconducting wafers, Optical proximity correction, Logic, Model-based design, Scanning electron microscopy

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Proceedings Article | 27 May 2010 Paper

Best depth of focus on 22-nm logic wafers with less shot count

Aki Fujimura, David Kim, Tadashi Komagata, Yasutoshi Nakagawa, Vikram Tolani, Tom Cecil

Proceedings Volume 7748, 77480V (2010) https://doi.org/10.1117/12.866413

KEYWORDS: Photomasks, Semiconducting wafers, SRAF, Vestigial sideband modulation, Scanning electron microscopy, Logic, Lithography, Manufacturing, Error analysis, Light sources

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Proceedings Article | 27 May 2010 Paper

Efficiently writing circular contacts on production reticle

Aki Fujimura, Christophe Pierrat, Taiichi Kiuchi, Tadashi Komagata, Yasutoshi Nakagawa

Proceedings Volume 7748, 77481P (2010) https://doi.org/10.1117/12.866412

KEYWORDS: Photomasks, Computer aided design, Semiconducting wafers, Manufacturing, Reticles, Vestigial sideband modulation, CAD systems, Tolerancing, Data modeling, Scanning electron microscopy

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Proceedings Article | 26 May 2010 Paper

Evaluation of a next generation EB mask writer for hp 32nm lithography

Tadashi Komagata, Takahisa Hasegawa, Kazuya Goto, Kenji Kono, Ryuuji Yamamoto, Naoki Nishida, Yasutoshi Nakagawa

Proceedings Volume 7748, 77480I (2010) https://doi.org/10.1117/12.866750

KEYWORDS: Photomasks, Lithography, Extreme ultraviolet lithography, Electron beams, Beam shaping, Semiconductors, Measurement devices, Double patterning technology, Critical dimension metrology, Interferometers

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Proceedings Article | 11 May 2009 Paper

Improvement of data transfer speed and development of an EB data verification system in a VSB mask writer

Osamu Wakimoto, Hironobu Manabe, Hiromichi Hoshi, Norihiko Samoto, Tadashi Komagata, Yasutoshi Nakagawa, Masaki Yamabe

Proceedings Volume 7379, 73791Z (2009) https://doi.org/10.1117/12.824312

KEYWORDS: Photomasks, Data processing, Lithography, Computing systems, Reliability, Data storage, Resolution enhancement technologies, Digital recording, Optical proximity correction, Control systems

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Proceedings Article | 19 May 2008 Paper

Improvement of position accuracy in mask-writing electron beam lithography with a multi-pass writing strategy for reducing position errors due to resist charging

Noriyuki Kobayashi, Kazuya Goto, Tetsuro Wakatsuki, Tadashi Komagata, Yasutoshi Nakagawa

Proceedings Volume 7028, 70281Y (2008) https://doi.org/10.1117/12.793076

KEYWORDS: Photomasks, Electron beams, Electron beam lithography, Raster graphics, Mask making, Chemically amplified resists, Semiconductors, Roads, Double patterning technology, Lithography

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Proceedings Article | 14 May 2007 Paper

Reduction of resist heating effect by writing order optimization: part II

Kazuya Goto, Kazutaka Watakabe, Tadashi Komagata, Yasutoshi Nakagawa

Proceedings Volume 6607, 660721 (2007) https://doi.org/10.1117/12.728984

KEYWORDS: Critical dimension metrology, Photomasks, Mask making, Electron beams, Chemically amplified resists, Electron beam lithography, Resolution enhancement technologies, Temperature metrology, Semiconductors, Roads

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Proceedings Article | 20 May 2006 Paper

Experimental characterization of constituent errors in electron-beam lithography

Russell Cinque, Peter Buck, Kyungsoo Yeo, Tadashi Komagata, Yasutoshi Nakagawa

Proceedings Volume 6283, 62831M (2006) https://doi.org/10.1117/12.681748

KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Error analysis, Metrology, Vestigial sideband modulation, Composites, Beam shaping, Calibration, Standards development

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Proceedings Article | 6 December 2004 Paper

Evaluation of overlay accuracy of phase-shift image for 65-nm node masks

Tadashi Komagata, Norio Kimura, Kaoru Funaki, Yasutoshi Nakagawa, Nobuo Gotoh

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568784

KEYWORDS: Photomasks, Phase shifts, Lithography, Electron beams, Electron beam lithography, Error analysis, Distortion, Overlay metrology, Optical alignment, Roads

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Proceedings Article | 20 August 2004 Paper

High-alignment-accuracy EB writing of phase shift image for 65-nm node masks

Norio Kimura, Tadashi Komagata, Yasutoshi Nakagawa, Nobuo Gotoh, Kazumitsu Tanaka

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557758

KEYWORDS: Electron beams, Phase shifts, Chromium, Image processing, Optical alignment, Etching, Photomasks, Coating, Distortion, Photoresist processing

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Proceedings Article | 28 August 2003 Paper

Development of a e-beam lithography system for 100- to 90-nm node reticles

Tadashi Komagata, Yuichi Kawase, Yasutoshi Nakagawa, Nobuo Gotoh, Kazumitsu Tanaka

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504261

KEYWORDS: Photomasks, Beam shaping, Reticles, Optical testing, Electron beam lithography, Glasses, Electron beams, Modulation, Scanning electron microscopy

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Proceedings Article | 5 September 2001 Paper

Performance of improved e-beam lithography system JBX-9000MVII

Tadashi Komagata, Yasutoshi Nakagawa, Nobuo Gotoh, Kazumitsu Tanaka

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438404

KEYWORDS: Optical testing, Photomasks, Signal detection, Critical dimension metrology, Reliability, Electron beams, Electron beam lithography, Photography, Beam shaping, Sensors

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Proceedings Article | 20 August 2001 Paper

Performance of the improved JBX-9000MV e-beam lithography system

Tadashi Komagata, Yasutoshi Nakagawa, Nobuo Gotoh, Kazumitsu Tanaka

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436697

KEYWORDS: Photomasks, Optical testing, Electron beam lithography, Photography, Electron beams, Chromium, Critical dimension metrology, Beam shaping, Reliability, Optical proximity correction

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Proceedings Article | 30 December 1999 Paper

Advanced e-beam lithography system JBX-9000MV for 180-nm masks

Hitoshi Takemura, Tadashi Komagata, Yasutoshi Nakagawa, Kazumitsu Tanaka

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373325

KEYWORDS: Photomasks, Beam shaping, Critical dimension metrology, Particles, Electron beam lithography, Vestigial sideband modulation, Electron beams, Semiconducting wafers, Optics manufacturing, Lithography

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Proceedings Article | 18 December 1998 Paper

Development of a next-generation e-beam lithography system

Yasutoshi Nakagawa, Tadashi Komagata, Hitoshi Takemura, Nobuo Gotoh, Kazumitsu Tanaka

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332823

KEYWORDS: Photomasks, Beam shaping, Electron beam lithography, Optical testing, Lithography, Reticles, Control systems, Precision measurement, Monochromatic aberrations

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Proceedings Article | 1 September 1998 Paper

Development of a next-generation e-beam lithography system for 1-Gb DRAM masks

Yasutoshi Nakagawa, Tadashi Komagata, Hitoshi Takemura, Nobuo Gotoh, Kazumitsu Tanaka

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328826

KEYWORDS: Photomasks, Beam shaping, Electron beam lithography, Lithography, Optical testing, Control systems, Electron beams, Smoothing, Monochromatic aberrations

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Proceedings Article | 5 June 1998 Paper

Development of a next-generation e-beam lithography system for 1-Gb DRAM masks

Tadashi Komagata, Yasutoshi Nakagawa, Hitoshi Takemura, Nobuo Gotoh, Kazumitsu Tanaka

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309585

KEYWORDS: Photomasks, Beam shaping, Electron beam lithography, Lithography, Control systems, Optical testing, Electron beams, Beam controllers, Computer aided design

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Proceedings Article | 28 July 1997 Paper

Development of an electron-beam optical column for the mask lithography system

Tadashi Komagata, Yasutoshi Nakagawa, Hitoshi Takemura, Nobuo Gotoh

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277296

KEYWORDS: Photomasks, Monochromatic aberrations, Lithography, Optical design, Beam shaping, Electrodes, Electron beams, Reticles, Optical simulations, Monte Carlo methods

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Showing 5 of 19 publications

Conference Committee Involvement (4)

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XI

14 April 2004 | Yokohama, Japan

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