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Yixiao Zhang
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Publications (1)
Proceedings Article | 30 April 2023 Presentation
A ML based OPC model pattern down-selection method with mask and wafer contours
Proceedings Volume PC12499, PC1249905 (2023) https://doi.org/10.1117/12.2662778
KEYWORDS: Semiconducting wafers, Photomasks, Optical proximity correction, Scanning electron microscopy, Calibration, Optical simulations, Machine learning, Wafer-level optics, Semiconductors, Semiconductor manufacturing
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