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Yongwook Lee
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Publications (1)
Proceedings Article | 10 April 2024 Poster + Paper
Wafer printability simulation of EUV mask defects using mask SEM and AFM
Donghwan Son, Lanpo He, Masaki Satake, Ying He, Kihun Park, Suhwan Kim, Jing Jiao, Peter Hu, Vikram Tolani, Kangjoon Seo, Kiwoo Jun, Heeyeon Jang, Sujeong Won, Bonseung Koo, Yongwook Lee, Sungha Woo, Euisang Park
Proceedings Volume 12955, 129552N (2024) https://doi.org/10.1117/12.3010196
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Printing, Extreme ultraviolet, Atomic force microscopy, Contour extraction, Binary data, Data processing, Scanners, Extreme ultraviolet lithography
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