Ms. Yoo-Jin Chae Profile

Yoo-Jin Chae

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Publications (1)

Proceedings Article | 9 October 2018 Paper

Defect avoidance for extreme ultraviolet mask defects using intentional pattern deformation

Yoo-Jin Chae, Rik Jonckheere, Puneet Gupta

Proceedings Volume 10809, 108091H (2018) https://doi.org/10.1117/12.2501525

KEYWORDS: Photomasks, Computer programming, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Metals, 193nm lithography, Semiconducting wafers, Safety, Yield improvement

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