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Yuri Vinshtein
at Bruker Technologies Ltd.
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Publications (1)
Proceedings Article | 22 February 2021 Presentation + Paper
X-ray critical dimension metrology solution for high aspect ratio semiconductor structures
Matthew Wormington, Adam Ginsburg, Israel Reichental, Alex Dikopoltsev, Alex Krokhmal, Yuri Vinshtein, Paul Ryan, Rahul Korlahalli, Franklin Wong, Silvio Rabello, Yang Song, Jie Li
Proceedings Volume 11611, 116110W (2021) https://doi.org/10.1117/12.2583966
KEYWORDS: X-rays, Semiconductors, Critical dimension metrology, Semiconducting wafers, Metrology, X-ray characterization, Scattering, Etching, Capacitors, 3D metrology
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