CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 12955 > Article
Presentation
10 April 2024 Metrology challenges for fabrication of high aspect ratio, nano scale x-ray diffraction gratings
Mark L. Schattenburg, Ralf Heilmann, Alexander R. Bruccoleri, Vittorio Colicci, Bethany Levenson, George A. Antonelli, Nicholas Keller
Author Affiliations +
Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 129550Z (2024) https://doi.org/10.1117/12.3010409
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
Next-generation space telescopes under development by NASA will require high efficiency and resolving power soft x-ray spectrometers which can provide an order of magnitude increased performance compared to present space instrumentation. For the past decade the MIT Space Nanotechnology Lab has developed new x-ray spectrometer concepts based on so-called critical-angle transmission (CAT) gratings which exploit the principle of efficient x-ray reflection below the critical angle for total external reflection. These devices require challenging high-aspect ratio (HAR) “nano mirror” grating patterns with well controlled bar tilt angle and sub-nm surface smoothness. Gratings are patterned with precision (110) SOI wafers using 193 nm lithography and etched using a Bosch process. In this paper we present the first results of applying Mueller Matrix OCD mapping to our silicon HAR device geometry and compare with small angle x-ray scattering results.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Mark L. Schattenburg, Ralf Heilmann, Alexander R. Bruccoleri, Vittorio Colicci, Bethany Levenson, George A. Antonelli, and Nicholas Keller "Metrology challenges for fabrication of high aspect ratio, nano scale x-ray diffraction gratings", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129550Z (10 April 2024); https://doi.org/10.1117/12.3010409
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 PRESENTATION
WATCH
PRESENTATION SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
KEYWORDS
Diffraction gratings
Semiconducting wafers
X-rays
Fabrication
Metrology
X-ray diffraction
Etching
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top