Dr. George A. Antonelli Profile

Dr. George A. Antonelli

Vice President of R&D

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Author

Publications (12)

Proceedings Article | 10 April 2024 Presentation

Metrology challenges for fabrication of high aspect ratio, nano scale x-ray diffraction gratings

Mark Schattenburg, Ralf Heilmann, Alexander Bruccoleri, Vittorio Colicci, Bethany Levenson, George Antonelli, Nicholas Keller

Proceedings Volume 12955, 129550Z (2024) https://doi.org/10.1117/12.3010409

KEYWORDS: Diffraction gratings, X-rays, Semiconducting wafers, X-ray diffraction, Metrology, Fabrication, Etching, Spectrometers, Spectral resolution, Reflection

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Proceedings Article | 10 April 2024 Presentation + Paper

Non-destructive measurement of bottom width in deep trench isolation structures using IRCD metrology

Nick Keller, Marc Poulingue, Ross Grynko, Troy Ribaudo, G. Andrew Antonelli, Victor Li, Marcello Ravasio, Delphine Le Cunff

Proceedings Volume 12955, 1295514 (2024) https://doi.org/10.1117/12.3010926

KEYWORDS: Simulations, Semiconducting wafers, Metrology, Nondestructive evaluation, Etching, Process control, Scatterometry

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Proceedings Article | 10 April 2024 Presentation + Paper

Superlattice effects and limitations of non-destructive measurement of advanced Si/Si(1-x)Ge(x) superlattice structures using Mueller matrix scatterometry (MMSE) and high-resolution x-ray diffraction (XRD)

Ezra Pasikatan, G. Andrew Antonelli, Nicholas Keller, Subhadeep Kal, Matthew Rednor, Markus Kuhn, Satoshi Murakami, Alain Diebold

Proceedings Volume 12955, 129550K (2024) https://doi.org/10.1117/12.3010523

KEYWORDS: Etching, Silicon, Superlattices, Scatterometry, Film thickness, Germanium, Scanning transmission electron microscopy, Mueller matrices, X-ray diffraction, Metrology

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Proceedings Article | 27 April 2023 Presentation + Paper

Measurement of W-recess profile in advanced node 3D NAND device with IRCD technology utilizing a specialized design-rule compliant target

Nick Keller, Zhuo Chen, Peter Wang, Rostislav Grynko, Troy Ribaudo, G. Andrew Antonelli, Youcheng Wang, Joshua Frederick, Sadao Takabayashi, John Hauck, Dan Engelhard

Proceedings Volume 12496, 124961Z (2023) https://doi.org/10.1117/12.2657719

KEYWORDS: Simulations, Metals, Finite-difference time-domain method, 3D acquisition, 3D metrology, Semiconducting wafers, Etching, Electric fields, Dielectrics, Plasmonics

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Proceedings Article | 27 April 2023 Poster + Presentation + Paper

Characteristic Mueller matrix responses and correlation analysis for vertical GAA nanowire structure manufacturing using RCWA simulated spectra

Colin Wadsworth, Ezra Pasikatan, Nicholas Keller, Andrew Antonelli, Alain Diebold

Proceedings Volume 12496, 1249619 (2023) https://doi.org/10.1117/12.2657690

KEYWORDS: Nanowires, Amorphous silicon, Silicon, Mueller matrices, Silica, Gallium arsenide, Etching, Transistors, Critical dimension metrology, Matrices

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Proceedings Article | 26 May 2022 Presentation + Paper

Imaging of buried overlay and alignment markers using picosecond acoustic microscopy

Manjusha Mehendale, Andy Antonelli, Robin Mair, Priya Mukundhan, Janusz Bogdanowicz, Victor Blanco, Anne-Laure Charley, Philippe Leray

Proceedings Volume 12053, 1205313 (2022) https://doi.org/10.1117/12.2614295

KEYWORDS: Acoustics, Optical alignment, Ruthenium, Picosecond phenomena, Microscopy, Principal component analysis, Raster graphics, Metals

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Proceedings Article | 26 May 2022 Presentation + Paper

Novel inline on-device measurement of silicon nitride lateral recess post channel hole ACI with IRCD metrology

Nick Keller, Wenmei Ming, Zhuo Chen, G. Andrew Antonelli, Troy Ribaudo, Zhuan Liu, Sadao Takabayashi, John Hauck, Joshua Frederick, Dan Engelhard

Proceedings Volume 12053, 120530T (2022) https://doi.org/10.1117/12.2618035

KEYWORDS: Silicon, Etching, Metrology, Semiconducting wafers, Mid-IR, Diffractive optical elements, Silica, Scattering, Critical dimension metrology, Absorption

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SPIE Journal Paper | 4 April 2022

Decorrelation of optical critical dimensions in mid-infrared ellipsometric spectroscopy of high aspect ratio etch profiles

Ahmad Fumani, Bin Yan, Nick Keller, G. Andrew Antonelli, Troy Ribaudo

JM3, Vol. 21, Issue 02, 021205, (April 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021205

KEYWORDS: Mid-IR, Etching, Critical dimension metrology, Silicon, Spectroscopy, Finite-difference time-domain method, Superlattices, Absorption, Refractive index, Polarization

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Proceedings Article | 22 February 2021 Presentation + Paper

Scatterometry of nanowire/nanosheet FETs for advanced technology nodes

Madhulika Korde, Subhadeep Kal, Cheryl Alix, Nick Keller, G. Andrew Antonelli, Aelan Mosden, Alain Diebold

Proceedings Volume 11611, 116111S (2021) https://doi.org/10.1117/12.2584751

KEYWORDS: Scatterometry, Field effect transistors, Metrology, Process control, Nanowires, Spectroscopic ellipsometry, Optical lithography, Inspection, Etching, Semiconducting wafers

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Proceedings Article | 22 February 2021 Presentation + Paper

Ellipsometric critical dimension metrology employing mid-infrared wavelengths for high-aspect-ratio channel hole module etch processes

G. Andrew Antonelli, Nick Keller, Troy Ribaudo, Franklin Wong, Wenmei Ming, Hepeng Ding, Zhuo Chen, Ross Grynko, Ahmad Fumani, Zhuan Liu, Sadao Takabayashi, John Hauck, Joshua Frederick, Dan Engelhard, Bo Hui Ng, Biow Hiem Ong, Luey Chwan Liong

Proceedings Volume 11611, 116111O (2021) https://doi.org/10.1117/12.2583786

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Proceedings Article | 11 October 2012 Paper

Advances in metrology for the determination of Young's modulus for low-k dielectric thin films

Sean King, George Antonelli, Gheorghe Stan, Robert Cook, R. Sooryakumar

Proceedings Volume 8466, 84660A (2012) https://doi.org/10.1117/12.930482

KEYWORDS: Dielectrics, Thin films, Metrology, Light scattering, Scattering, Acoustics, Semiconductors, Metals, Standards development, Atomic force microscopy

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Proceedings Article | 17 March 2012 Paper

The effects of plasma exposure on low-k dielectric materials

J. Shohet, H. Ren, M. Nichols, H. Sinha, W. Lu, K. Mavrakakis, Q. Lin, N. Russell, M. Tomoyasu, G. Antonelli, S. Engelmann, N. Fuller, V. Ryan, Y. Nishi

Proceedings Volume 8328, 83280I (2012) https://doi.org/10.1117/12.917967

KEYWORDS: Plasma, Dielectrics, Ions, Vacuum ultraviolet, Ultraviolet radiation, Synchrotrons, Silicon, Nitrogen, Oxygen, Plasma systems

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Showing 5 of 12 publications

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