An analysis of EUV-resist outgassing measurements

Kim R. Dean; Iwao Nishiyama; Hiroaki Oizumi; Anthony Keen; Heidi Cao; Wang Yueh; Takeo Watanabe; Paolo Lacovig; Luca Rumiz; Gregory Denbeaux; Julia Simon

doi:10.1117/12.712379

4 April 2007 An analysis of EUV-resist outgassing measurements

Kim R. Dean, Iwao Nishiyama, Hiroaki Oizumi, Anthony Keen, Heidi Cao, Wang Yueh, Takeo Watanabe, Paolo Lacovig, Luca Rumiz, Gregory Denbeaux, Julia Simon

Author Affiliations +

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 65191P (2007) https://doi.org/10.1117/12.712379
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Optics contamination is a concern for extreme ultraviolet (EUV) lithography. To protect EUV optics, all materials used in EUV vacuum exposure chambers must be screened prior to use. Photoresists are a concern since a freshly coated wafer will be introduced into the chamber approximately every minute in a high volume production tool. SEMATECH and the International EUV Initiative (IEUVI) have begun a resist outgassing benchmarking experiment to compare different outgassing methodologies. Samples of the same batch of resist were sent to eight researchers. The results show a large variation of four orders of magnitude in the amount of measured outgassing products. The next steps are to correlate outgassing measurements to witness plate experiments.

Citation Download Citation

Kim R. Dean, Iwao Nishiyama, Hiroaki Oizumi, Anthony Keen, Heidi Cao, Wang Yueh, Takeo Watanabe, Paolo Lacovig, Luca Rumiz, Gregory Denbeaux, and Julia Simon "An analysis of EUV-resist outgassing measurements", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65191P (4 April 2007); https://doi.org/10.1117/12.712379

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available