Simultaneous measurements of thin-film thickness and refractive index by dispersive white-light interferometry

Young-Sik Ghim; Joonho You; Seung-Woo Kim

doi:10.1117/12.732311

14 September 2007 Simultaneous measurements of thin-film thickness and refractive index by dispersive white-light interferometry

Young-Sik Ghim, Joonho You, Seung-Woo Kim

Author Affiliations +

Proceedings Volume 6674, Thin-Film Coatings for Optical Applications IV; 667402 (2007) https://doi.org/10.1117/12.732311
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

A dispersive method of white-light interferometry for measuring the tomographical thickness profile of a thin-film layer through a Fourier-transform analysis of a spectrally-resolved interference signal is proposed. The refractive index is also determined without prior knowledge of the geometrical thickness of the film layer. In contrast with standard white-light scanning interferometry, dispersive white-light interferometry generates the spectral distribution of interferograms directly by means of dispersive optics without mechanical depth scanning. Therefore, the proposed method in this paper is well suited for in-line 3-D inspection of dielectric thin-film layers, particularly for the semiconductor and flat-panel display industry, with high immunity to external vibration and high measurement speed.

Citation Download Citation

Young-Sik Ghim, Joonho You, and Seung-Woo Kim "Simultaneous measurements of thin-film thickness and refractive index by dispersive white-light interferometry", Proc. SPIE 6674, Thin-Film Coatings for Optical Applications IV, 667402 (14 September 2007); https://doi.org/10.1117/12.732311

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