Mr. Angus Sheng-Ji Chin Profile

Angus Sheng-Ji Chin

Mask Department Manager at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 18 December 2015 Paper

Key indexes of the effectiveness of mask surface treatments

Chen-Yang Lin, Chung-Hsuan Liu, Kuan-Wen Lin, Chi-Lun Lu, Luke Hsu, Angus Chin, Anthony Yen

Proceedings Volume 9635, 963519 (2015) https://doi.org/10.1117/12.2197675

KEYWORDS: Chromium, Ruthenium, Particles, Digital watermarking, Plasma, Photomasks, Oxygen, Extreme ultraviolet, Inspection, Quartz

Read Abstract +

SPIE Journal Paper | 16 June 2014

Mask defect management in extreme-ultraviolet lithography

Nai-Ching Chen, Chia-Hao Yu, Ching-Fang Yu, Chi-Lun Lu, James Chu, Luke Hsu, Angus Chin, Anthony Yen

JM3, Vol. 13, Issue 02, 023010, (June 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.2.023010

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Particles, Semiconducting wafers, Extreme ultraviolet lithography, Deep ultraviolet, Lithography, Critical dimension metrology, Defect detection

Read Abstract +

Proceedings Article | 28 June 2013 Paper

Physical force optimization for advanced photomask cleaning

C. W. Shen, K. W. Lin, C. L. Lu, Luke Hsu, Angus Chin, Anthony Yen

Proceedings Volume 8701, 870106 (2013) https://doi.org/10.1117/12.2028484

KEYWORDS: Particles, SRAF, Mask cleaning, Photomasks, Inspection, Binary data, Acoustics, Opacity, Cavitation, Diffractive optical elements

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Sub-20-nm node photomask cleaning enhancement by controlling zeta potential

Kuan-Wen Lin, Chi-Lun Lu, Chin-Wei Shen, Luke Hsu, Angus Chin, Anthony Yen

Proceedings Volume 8522, 852213 (2012) https://doi.org/10.1117/12.975822

KEYWORDS: Particles, Mask cleaning, Photomasks, Quartz, Chemical analysis, Critical dimension metrology, Semiconductor manufacturing, Silicon, Inspection, Manufacturing

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Study of critical dimension uniformity (CDU) using a mask inspector

Mei-Chun Lin, Ching-Fang Yu, Mei-Tsu Lai, Luke Hsu, Angus Chin, Anthony Yen

Proceedings Volume 8522, 85220C (2012) https://doi.org/10.1117/12.977944

KEYWORDS: Inspection, Critical dimension metrology, Scanning electron microscopy, Photomasks, Visualization, Opacity, Metrology, Data acquisition, Image analysis, Databases

Read Abstract +

Proceedings Article | 7 April 2011 Paper

Printability of buried mask defects in extreme UV lithography

Pei-Cheng Hsu, Ming-Jiun Yao, Wen-Chang Hsueh, Chia-Jen Chen, Shin-Chang Lee, Ching-Fang Yu, Luke Hsu, Sheng-Ji Chin, Jimmy Hu, Shu-Hao Chang, Chih-T'sung Shih, Yen-Cheng Lu, Timothy Wu, Shinn-Sheng Yu, Anthony Yen

Proceedings Volume 7969, 79691D (2011) https://doi.org/10.1117/12.881583

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Etching, Extreme ultraviolet, Manufacturing, Deposition processes, Defect inspection, Chromium, Lithography

Read Abstract +

Proceedings Article | 29 September 2010 Paper

Inspection of advanced computational lithography logic reticles using a 193-nm inspection system

Ching-Fang Yu, Mei-Chun Lin, Mei-Tsu Lai, Luke T.H. Hsu, Angus Chin, S. C. Lee, Anthony Yen, Jim Wang, Ellison Chen, David Wu, William Broadbent, William Huang, Zinggang Zhu

Proceedings Volume 7823, 78232F (2010) https://doi.org/10.1117/12.865604

KEYWORDS: Reticles, Inspection, SRAF, Semiconducting wafers, Computational lithography, Control systems, Defect detection, Databases, Model-based design, Optical proximity correction

Read Abstract +

Proceedings Article | 25 September 2010 Paper

Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography

C. L. Lu, C. H. Yu, W. H. Liu, Luke Hsu, Angus Chin, S. C. Lee, Anthony Yen, Gaston Lee, Peter Dress, Sherjang Singh, Uwe Dietze

Proceedings Volume 7823, 782325 (2010) https://doi.org/10.1117/12.864303

KEYWORDS: Binary data, Particles, Photomasks, SRAF, Nitrogen, Personal digital assistants, Liquids, Quartz, Mask cleaning, Atomic force microscopy

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Global CD uniformity improvement in mask manufacturing for advanced lithography

Shih-Ming Chang, Chih-Cheng Chin, Wen-Chuan Wang, Chi-Lun Lu, Ren-Guey Hsieh, Cherng-Shyan Tsay, Yung-Sung Yen, Sheng-Chi Chin, Hsin-Chang Lee, Ru-Gun Liu, Kuei-Shun Chen, Hung-Chang Hsieh, Yao Ku, John Lin

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518008

KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Lithography, Manufacturing, Inspection, Etching, Software development, Semiconductor manufacturing, Control systems

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Mask pattern fidelity quantification

Wen-Chuan Wang, Shih-Ming Chang, Chih-Cheng Chin, Chi-Lun Lu, Angus S.J. Chin, Hung-Chang Hsieh, Shinn-Sheng Yu

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518041

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Image processing, Lithography, Image analysis, Image enhancement, Scanning electron microscopy, Photoresist processing, Logic

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Mask cost and cycle time reduction

Hong-Chang Hsieh, Johnson Hung, Angus Chin, Sheng-Cha Lee, Jaw-Jung Shin, Ru-Gun Liu, Burn Lin

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504288

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Semiconducting wafers, Defect inspection, Lithography, Critical dimension metrology, Mask making, Manufacturing, Vestigial sideband modulation

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Study of loading effect on dry etching process

Shih-Ming Chang, Chih-Cheng Chin, Wen-Chuan Wang, Chi-Lun Lu, Sheng-Chi Chin, Hong-Chang Hsieh

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504193

KEYWORDS: Etching, Critical dimension metrology, Dry etching, Photomasks, Optical lithography, Control systems, Manufacturing, Mask making, Cadmium, Inspection

Read Abstract +

Showing 5 of 12 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years