Mr. Timothy Wu Profile

Timothy Wu

at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 23 March 2012 Paper

The role resist plays in EUVL extensibility

Shinn-Sheng Yu, Anthony Yen, Chih-T'sung Shih, Yen-Cheng Lu, Shu-Hao Chang, Jui-Ching Wu, Jimmy Hu, Timothy Wu

Proceedings Volume 8322, 83222A (2012) https://doi.org/10.1117/12.916024

KEYWORDS: Extreme ultraviolet lithography, Electroluminescence, Diffusion, Lithography, Extreme ultraviolet, Modulation transfer functions, Nanoimprint lithography, Performance modeling, Photomasks, Image resolution

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Proceedings Article | 8 April 2011 Paper

On the extensibility of extreme UV lithography

Shinn-Sheng Yu, Anthony Yen, Shu-Hao Chang, Chih-T'sung Shih, Yen-Cheng Lu, Jimmy Hu, Timothy Wu

Proceedings Volume 7969, 79693A (2011) https://doi.org/10.1117/12.881586

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Electroluminescence, Extreme ultraviolet, Lithography, Phase shifts, Scanners, Optical lithography, Semiconducting wafers, Imaging systems

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Proceedings Article | 7 April 2011 Paper

Printability of buried mask defects in extreme UV lithography

Pei-Cheng Hsu, Ming-Jiun Yao, Wen-Chang Hsueh, Chia-Jen Chen, Shin-Chang Lee, Ching-Fang Yu, Luke Hsu, Sheng-Ji Chin, Jimmy Hu, Shu-Hao Chang, Chih-T'sung Shih, Yen-Cheng Lu, Timothy Wu, Shinn-Sheng Yu, Anthony Yen

Proceedings Volume 7969, 79691D (2011) https://doi.org/10.1117/12.881583

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Etching, Extreme ultraviolet, Manufacturing, Deposition processes, Defect inspection, Chromium, Lithography

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Proceedings Article | 16 March 2009 Paper

Ultimate contact hole resolution using immersion lithography with line/space imaging

V. Truffert, J. Bekaert, F. Lazzarino, M. Maenhoudt, A. Miller, M. Moelants, T. Wu

Proceedings Volume 7274, 72740N (2009) https://doi.org/10.1117/12.814867

KEYWORDS: Etching, Photomasks, Tin, Oxides, Semiconducting wafers, Optical lithography, Critical dimension metrology, Scanners, Photoresist developing, Electroluminescence

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Proceedings Article | 7 March 2008 Paper

Pellicle effect on OPC modeling

Boren Luo, Chi-Kang Chang, W. Wang, W. Huang, Timothy Wu, C. Lai, R. Liu, H. Lin, K. Chen, Y. Ku

Proceedings Volume 6924, 69243T (2008) https://doi.org/10.1117/12.775419

KEYWORDS: Pellicles, Optical proximity correction, Photomasks, Data modeling, Polarization, Immersion lithography, Projection systems, Diffraction, Signal attenuation, Critical dimension metrology

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Proceedings Article | 24 March 2006 Paper

ArF scanner performance improvement by using track integrated CD optimization

Jacky Huang, Shinn-Sheng Yu, Chih-Ming Ke, Timothy Wu, Yu-Hsi Wang, Tsai-Sheng Gau, Dennis Wang, Allen Li, Wenge Yang, Araki Kaoru

Proceedings Volume 6152, 615228 (2006) https://doi.org/10.1117/12.656104

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Sensors, Calibration, Error analysis, Scanners, Infrared sensors, Metrology, Wafer-level optics, Integrated optics

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Proceedings Article | 28 June 2005 Paper

Low K1 post printing using phase shifting mask

Yung-Tin Chen, M. Lee, C. Chen, Y. Huang, Timothy Wu, B. Ho

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617202

KEYWORDS: Photomasks, Printing, Phase shifting, Photoresist processing, Lithography, Phase shifts, Semiconductors, Resolution enhancement technologies, Semiconductor manufacturing, 3D printing

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Showing 5 of 7 publications

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