CONFERENCE PROCEEDINGS
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Feng Tian
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Author
Publications (4)
Proceedings Article | 26 May 2022 Presentation + Paper
A novel methodology for wafer-level scanner focus spot capture and back-tracing mechanism
Chieh-Chen Chiu, Mingqi Gao, Feng Tian, Wei Feng, Andy Lan, Dan Li, Shengyuan Zhong, Aijiao Zhu, Ningqi Zhu, Yunchen Xu, Jin Zhu, Jincheng Pei, Kevin Huang
Proceedings Volume 12053, 120530U (2022) https://doi.org/10.1117/12.2627284
KEYWORDS: Semiconducting wafers, Contamination, Scanners, Data processing, Statistical analysis, Detection and tracking algorithms, Optical lithography, Lithography, Data analysis
Proceedings Article | 26 May 2022 Poster + Presentation + Paper
A new development algorithm to optimize scanner alignment sampling for cross-chuck overlay performance optimization
Chieh-Chen Chiu, Feng Tian, Wei Feng, Mingqi Gao, Andy Lan, Chao-Jen Tsou, Shengyuan Zhong, Norman Birnstein, Robin Maximilian Zech, Clemens Utzny, Jin Zhu, Jincheng Pei, Kevin Huang
Proceedings Volume 12053, 1205329 (2022) https://doi.org/10.1117/12.2627283
KEYWORDS: Optical alignment, Optimization (mathematics), Scanners, Semiconducting wafers, Overlay metrology, Data modeling, Performance modeling, Semiconductors
Proceedings Article | 26 May 2022 Poster + Presentation + Paper
A comprehensive study of scanner alignment mark quantity and layout-dependent effect for overlay performance optimization
Proceedings Volume 12053, 1205319 (2022) https://doi.org/10.1117/12.2614375
KEYWORDS: Optical alignment, Semiconducting wafers, Scanners, Overlay metrology, Optimization (mathematics), Computer simulations, Performance modeling, Device simulation, Data modeling
Proceedings Article | 26 May 2022 Poster + Presentation + Paper
Overcome machine to machine overlay for better scanner mix-run control
Chieh-Chen Chiu, Feng Tian, Wei Feng, Mingqi Gao, Andy Lan, Aijiao Zhu, Ningqi Zhu, Dan Li, Jin Zhu, Jincheng Pei, Kevin Huang
Proceedings Volume 12053, 1205318 (2022) https://doi.org/10.1117/12.2614372
KEYWORDS: Scanners, Optical parametric oscillators, Semiconducting wafers, Reticles, Performance modeling, Optical lithography, Switching, Manufacturing, Lithography
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