Dr. Gu Xu Profile

Dr. Gu Xu

at Brewer Science Inc

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 12 March 2024 Poster + Paper

High-refractive-index polymers with high transparency

Yunyan Wang, Runhui Huang, Sean Simmons, Megan Bennett, Gu Xu

Proceedings Volume 12913, 129131E (2024) https://doi.org/10.1117/12.3000542

KEYWORDS: Microlens, Polymers, Refractive index, Semiconducting wafers, Film thickness, Plasma etching, Waveguides, Transparency, Thermal stability, Silicon, Polymer optics

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Proceedings Article | 23 March 2020 Paper

Development of planarizing spin-on carbon materials for high-temperature processes

Runhui Huang, Xing-Fu Zhong, Jakub Koza, Boyu Zhang, Gu Xu, Sean Simmons

Proceedings Volume 11326, 113261O (2020) https://doi.org/10.1117/12.2552128

KEYWORDS: Polymers, Carbon, Silicon, Plasma enhanced chemical vapor deposition, Coating, Lithography

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Proceedings Article | 24 April 2002 Paper

High-resolution dyed color-filter-material for use in digital photography applications: cyan, magenta, and yellow color photoresists

Gu Xu, Jonathan Mayo, Curtis Planje, Lorie Rieken, Gary Brand

Proceedings Volume 4669, (2002) https://doi.org/10.1117/12.463442

KEYWORDS: Optical filters, Photoresist materials, Polymers, Ultraviolet radiation, Digital photography, Charge-coupled devices, Image resolution, Semiconducting wafers, Coating, CCD image sensors

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Proceedings Article | 24 August 2001 Paper

Development of full-fill bottom antireflective coatings for dual-damascene process

Yubao Wang, Xiaoming Wu, Gu Xu, James Lamb, John Sullivan, James Claypool, Jackie Backus, Sean Trautman, Xie Shao, Satoshi Takei, Yasuhisa Sone, Kenichi Mizusawa, Hiroyoshi Fukuro

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436917

KEYWORDS: Coating, Etching, Photoresist materials, Semiconducting wafers, Bottom antireflective coatings, Antireflective coatings, Lithography, Thin films, Critical dimension metrology, Deep ultraviolet

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Proceedings Article | 23 June 2000 Paper

Second-generation 193-nm bottom antireflective coatings (BARCs)

James Meador, Xie Shao, Vandana Krishnamurthy, Mikko Arjona, Mandar Bhave, Gu Xu, James Claypool, Anne Lindgren

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388264

KEYWORDS: Reflectivity, Etching, Polymers, Plasma etching, Manufacturing, Photoresist materials, Lithography, Semiconducting wafers, Particles, Absorbance

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Proceedings Article | 2 June 2000 Paper

Advancements in organic antireflective coatings for dual-damascene processes

Shreeram Deshpande, Xie Shao, James Lamb, Nickolas Brakensiek, Joe Johnson, Xiaoming Wu, Gu Xu, William Simmons

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386539

KEYWORDS: Etching, Optical lithography, Metals, Photoresist processing, Copper, Dielectrics, Critical dimension metrology, Photomasks, Semiconductor manufacturing, Semiconductors

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Proceedings Article | 11 June 1999 Paper

Recent progress in 193-nm antireflective coatings

James Meador, Douglas Guerrero, Gu Xu, Xie Shao, Norman Dobson, James Claypool, Kelly Nowak

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350269

KEYWORDS: Photoresist materials, Etching, Plasma etching, Polymers, Absorbance, Reflectivity, Plasma, Chemistry, Data modeling, Silicon

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Proceedings Article | 29 June 1998 Paper

Deep-ultraviolet antireflective coating with improved conformality, optical density, and etch rate

Douglas Guerrero, James Meador, Gu Xu, Hitoshi Suzuki, Yasuhisa Sone, Vandana Krishnamurthy, James Claypool, James Lamb

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312412

KEYWORDS: Etching, Photoresist materials, Absorbance, Reflectivity, Deep ultraviolet, Critical dimension metrology, Chemistry, Lithography, Coating, Antireflective coatings

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Proceedings Article | 29 June 1998 Paper

New antireflective coatings for 193-nm lithography

Gu Xu, Douglas Guerrero, Norman Dobson

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312401

KEYWORDS: Photoresist materials, Polymers, Lithography, Absorbance, Ultraviolet radiation, Etching, Antireflective coatings, Plasma etching, Coating, Deep ultraviolet

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Showing 5 of 9 publications

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