Dr. Jae-Hyun Kim
Vice President at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 27 March 2014 Paper
Dong-Gyun Kim, Su-Jee Kwon, Suk-Koo Hong, Joon Je Lee, Hyung Rae Lee, Hyo-jin Yun, Ji-Hoon Baik, Dohyuk Im, Eujean Jang, Jae-Woo Lee, Jae-Hyun Kim, Jong-Chan Lee
Proceedings Volume 9051, 905126 (2014) https://doi.org/10.1117/12.2048674
KEYWORDS: Polymers, Photoresist materials, Lithography, Photoresist developing, Nitrogen, Particle swarm optimization, Polymerization, Photoresist processing, Scanning electron microscopy, Etching

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79721Q (2011) https://doi.org/10.1117/12.879581
KEYWORDS: Photoresist materials, Polymers, Photoresist developing, Critical dimension metrology, Bottom antireflective coatings, Lithography, Reflectivity, Double patterning technology, Etching, Temperature metrology

Proceedings Article | 31 March 2010 Paper
Jae Hyun Kim, Sung Il Ahn, Jin Goo Yoon, Youngho Kim, Seung-Ki Chae, Wang-Cheol Zin
Proceedings Volume 7639, 76391P (2010) https://doi.org/10.1117/12.858362
KEYWORDS: Photoresist materials, Interfaces, Reflectivity, Molecules, X-rays, Polymers, Molecular interactions, Polymer thin films, Lithography, Thin films

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76362Y (2010) https://doi.org/10.1117/12.846518
KEYWORDS: Diffusion, Polymers, Extreme ultraviolet lithography, Line width roughness, Extreme ultraviolet, Deep ultraviolet, Line edge roughness, Optical lithography, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 1 April 2009 Paper
Jeongsik Kim, Jae-Woo Lee, Deogbae Kim, Jaehyun Kim, Sung-Il Ahn, Wang-Cheol Zin
Proceedings Volume 7273, 72732W (2009) https://doi.org/10.1117/12.814449
KEYWORDS: X-rays, Reflectivity, Glasses, Line width roughness, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Chemical analysis, Molecular interactions, Polymers

Showing 5 of 31 publications
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