Mr. Marco Guajardo Profile

Marco Guajardo

at Synopsys Inc

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Author

Publications (6)

Proceedings Article | 23 April 2021 Presentation + Paper

Fast model-driven target optimization methods using machine learnings

Marco Guajardo, Ahmed Omran, Howard Clark

Proceedings Volume 11614, 116140Z (2021) https://doi.org/10.1117/12.2587122

KEYWORDS: Machine learning, Optimization (mathematics), Model-based design, Optical proximity correction, Photomasks, Neural networks, Image segmentation, Convolution

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Proceedings Article | 22 February 2021 Presentation

Validation of machine learning OPC compact models for advanced manufacturing

Moongyu Jeong, Marco Guajardo, Cheng-En Wu, Song-haeng Lee, Tim Fuehner, Lena Zavyalova, Li-Jin Chen, Hua Song, Kevin Lucas

Proceedings Volume 11614, 116140R (2021) https://doi.org/10.1117/12.2584940

KEYWORDS: Optical proximity correction, Machine learning, Data modeling, Manufacturing, Critical dimension metrology, Semiconductors, Photomasks, Semiconducting wafers, Optical lithography, Neural networks

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Proceedings Article | 26 March 2020 Paper

Implementing Machine Learning for OPC retargeting

Kevin Hooker, Marco Guajardo, Nai-Chia Cheng, Guangming Xiao

Proceedings Volume 11328, 113281D (2020) https://doi.org/10.1117/12.2552402

KEYWORDS: Data modeling, Optical proximity correction, Photomasks, Lithography, Machine learning, Statistical modeling, Error analysis, Semiconducting wafers, Optimization (mathematics), Optical lithography

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Proceedings Article | 26 March 2020 Presentation + Paper

Implementing Machine Learning OPC on product layouts

Hesham Abdelghany, Kevin Hooker, Marco Guajardo, Chia-Chun Lu

Proceedings Volume 11328, 1132805 (2020) https://doi.org/10.1117/12.2552398

KEYWORDS: Data modeling, Optical proximity correction, Machine learning, Neural networks, Double patterning technology, Lithography, Deep ultraviolet, Semiconductors, Photomasks, Image segmentation

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Proceedings Article | 20 March 2019 Paper

Investigation of machine learning for dual OPC and assist feature printing optimization

Marco Guajardo, Yulu Chen, Peter Brooker, C.-E. Wu, Kevin Hooker, Folarin Latinwo, Kevin Lucas

Proceedings Volume 10962, 109620E (2019) https://doi.org/10.1117/12.2516134

KEYWORDS: Printing, Optical proximity correction, Photomasks, Calibration, 3D modeling, Semiconducting wafers, Machine learning, Data modeling, Lithography

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Proceedings Article | 16 October 2017 Paper

Improved testpatterns and coverage for complex SrAF to optimize 5nm and below OPC and mask patterning

Marco Guajardo, Hesham Abdelghany, Ahmed Omran, Yu Chen, Kevin Lucas

Proceedings Volume 10451, 104511N (2017) https://doi.org/10.1117/12.2280585

KEYWORDS: SRAF, Neural networks, Optical proximity correction, Manufacturing, Neurons, Optical lithography, Machine learning, Data modeling, Control systems

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Showing 5 of 6 publications

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