Mr. Martin Freitag Profile

Martin Freitag

Customer Engagement Manager at Qoniac GmbH

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Author

Publications (4)

Proceedings Article | 10 April 2024 Poster + Paper

Advanced cross-layer overlay simulation with exposure grid re-calculation

Yueh-Feng Lu, Chao-Jen Tsou, Onur Demirer, Holger Bald, Siegfried Hille, Meng-Syun Li, Martin Freitag, Clemens Utzny, Scott Eitapence, Boris Habets, Cheng-Shuai Li, Kao-Tsai Tsai

Proceedings Volume 12955, 1295524 (2024) https://doi.org/10.1117/12.3009745

KEYWORDS: Optical alignment, Semiconducting wafers, Alignment modeling, Overlay metrology, Optical lithography, Scanners, Systems modeling, Performance modeling, Control systems, Computer simulations

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Proceedings Article | 22 February 2021 Presentation + Paper

Innovative dual mark design for alignment verification and process monitoring in advanced lithography

Jia Hung Chang, En Chuan Lio, Junjin Lin, Tang Chun Weng, Bill Lin, Patrick Lomtscher, Martin Freitag, Stefan Buhl, Hsiao Lin Hsu, Rex Liu

Proceedings Volume 11613, 116130K (2021) https://doi.org/10.1117/12.2583620

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Proceedings Article | 26 March 2019 Paper

Intra-field alignment for overlay feed-forward simulation with sampling optimization

Cheng Hao Yang, Chun Chi Yu, Patrick Lomtscher, Martin Freitag, Steven Tottewitz, Boris Habets, Hsiao Lin Hsu, Rex Liu

Proceedings Volume 10959, 109592T (2019) https://doi.org/10.1117/12.2514984

KEYWORDS: Semiconducting wafers, Optical alignment, Data modeling, Overlay metrology, Data corrections, Visualization, Lithography, Reticles, Optimization (mathematics)

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Proceedings Article | 13 March 2018 Paper

Advanced combined overlay and CD uniformity measurement mark for double patterning

Hsiao Lin Hsu, En Chuan Lio, Charlie Chen, Jia Hung Chang, Sho Shen Lee, Stefan Buhl, Manuela Gutsch, Patrick Lomtscher, Martin Freitag, Boris Habets, Rex Liu

Proceedings Volume 10585, 105851H (2018) https://doi.org/10.1117/12.2299299

KEYWORDS: Overlay metrology, Etching, Lithography, Semiconducting wafers, Metrology, Critical dimension metrology, Molybdenum, Information operations, Optical lithography, Double patterning technology

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