Dr. Massud A. Aminpur Profile

Dr. Massud A. Aminpur

at GlobalFoundries

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 20 June 2023 Presentation + Paper

Advanced process technologies for photonics waveguide patterning

Erik Geiss, Massud Aminpur, Ryan Sporer, Vijayalakshmi Seshachalam, Padraig Timoney, Brendan O'Brien, Josh LaRose, Eitan Barlaz, Cameron Werner, Katie Lutker-Lee, Luis Fernandez, Brian Pfeifer, Chimaobi Mbanaso, Yan Shao, Angélique Raley

Proceedings Volume PC12499, PC124990B (2023) https://doi.org/10.1117/12.2657729

KEYWORDS: Semiconducting wafers, Waveguides, Etching, Atomic layer deposition, Plasma etching, Plasma, Line edge roughness, Silicon, Vacuum ultraviolet, Film thickness

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Proceedings Article | 30 April 2023 Presentation

Challenges in advanced 300mm silicon photonics technology

Massud Aminpur, Erik Geiss, Vijayalakshmi Seshashalam, Brendan O'Brien, Jean Raymod Fakhoury, Joerg Paufler, San Leong Liew, Ken Shea, Keith Donegan, Ryan Sporer, Wenhe Lin

Proceedings Volume PC12499, PC124990A (2023) https://doi.org/10.1117/12.2658702

KEYWORDS: Silicon photonics, Waveguides, Semiconductor lasers, Quantum computing, Modulators, Manufacturing, Germanium, Diodes, Data centers

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SPIE Journal Paper | 19 March 2012

Escaping death: single-patterning contact printing for 32/28-nm logic technology nodes

Bradley Morgenfeld, Ian Stobert, Ju Jin An, Massud Aminpur, Colin Brodsky, Alan Thomas, Henning Haffner, Martin Ostermayr, Hideki Kanai, Norman Chen

JM3, Vol. 11, Issue 1, 013010, (March 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013010

KEYWORDS: SRAF, Printing, Optical proximity correction, Optical lithography, Critical dimension metrology, Etching, Logic, Photomasks, Semiconducting wafers, Model-based design

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Proceedings Article | 23 March 2011 Paper

Contact patterning strategies for 32nm and 28nm technology

Bradley Morgenfeld, Ian Stobert, Ju j An, Hideki Kanai, Norman Chen, Massud Aminpur, Colin Brodsky, Alan Thomas

Proceedings Volume 7973, 797319 (2011) https://doi.org/10.1117/12.879773

KEYWORDS: Optical lithography, SRAF, Critical dimension metrology, Etching, Semiconducting wafers, Model-based design, Photomasks, Lithography, Optical proximity correction, Double patterning technology

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