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Mizuki Odaka
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Publications (1)
Proceedings Article | 29 September 2023 Paper
New multi-beam mask data preparation method for EUV high volume data
Kyungsup Shin, Sunyoung Kim, Jihyeon Choi, Eokbong Kim, Sanghee Lee, Harald Hoeller-Lugmayr, Amir Moqanaki, Annette Schnettelker, Mathias Tomandl, Christof Zillner, Yohei Torigoe, Taigo Fujii, Ryunosuke Miyake, Mizuki Odaka, Issei Masumoto, Masakazu Hamaji
Proceedings Volume 12915, 129150D (2023) https://doi.org/10.1117/12.2683168
KEYWORDS: Extreme ultraviolet, Design and modelling, Electronic design automation, Algorithm development, Mathematical optimization, Data conversion, Product engineering, Optical proximity correction, Nanofabrication, Lithography
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